![micromachines
Editorial
Editorial for the Special Issue on 2D Nanomaterials Processing
and Integration in Miniaturized Devices
Candido Fabrizio Pirri 1,2,* and Matteo Cocuzza 1,3,*
Citation: Pirri, C.F.; Cocuzza, M.
Editorial for the Special Issue on 2D
Nanomaterials Processing and
Integration in Miniaturized Devices.
Micromachines 2021, 12, 254. https://
doi.org/10.3390/mi12030254
Received: 25 February 2021
Accepted: 1 March 2021
Published: 2 March 2021
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Copyright: © 2021 by the authors.
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This article is an open access article
distributed under the terms and
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Attribution (CC BY) license (https://
creativecommons.org/licenses/by/
4.0/).
1 Department of Applied Science and Technology (DISAT), Politecnico di Torino, C.so Duca degli Abruzzi 24,
10129 Turin, Italy
2 Center for Sustainable Future Technologies, Istituto Italiano di Tecnologia, Via Livorno 60, 10144 Turin, Italy
3 Institute of Materials for Electronics and Magnetism, IMEM-CNR, Parco Area delle Scienze 37/A,
43124 Parma, Italy
* Correspondence: fabrizio.pirri@polito.it (C.F.P.); matteo.cocuzza@infm.polito.it (M.C.)
Initially considered little more than a scientific curiosity, the family of 2D nanomateri-
als has become increasingly popular over the last decade. Starting from the undisputed
progenitor, i.e., graphene, which to date has reached a technological maturity and a criti-
cal mass of knowledge to allow envisaging multiple applications in real manufacturing,
numerous other materials have progressively been added to this family: transition metal
dichalcogenides, boron nitride, metal oxide nanosheets, MXenes, layered double hydrox-
ides, etc. Similarly, the range of applications under study and development has expanded,
integrating and taking advantage of the unique properties of 2D nanostructured materials:
sensors, optical applications, photovoltaics, touch screens, catalysis, filtration and exploita-
tion as fillers to modulate the mechanical, electrical and chemical properties of the host
matrices. Such a plethora of material/application combinations, in addition to the obvious
technical requirements related to the synthesis of materials and the optimization of purity,
composition, morphology and yield, also presents significant technological challenges
for the corresponding processing, patterning and above all integration into systems and
devices of higher dimensionality for the real exploitation of their unique properties. The
present Special Issue is then focused on such last topics, collecting eight research papers
and one review article dealing with MoS2 [1], graphene [2–4] and other 2D nanomaterials
integrated onto several kinds of materials and structures (nanogap [1], porous silicon [5],
silicon carbide [6]) and for different applications (photoluminescence [1], ink-jet printing [7],
optics and plasmonics [2,8], lubrication [3], innovative patterning [4], biomedicine [9]).
In particular, Yang et al. [1] proposed an innovative solution to bypass the limitation
of the atomic thickness of monolayer MoS2 hindering its optical absorption and emission
in view of optoelectronic applications. By integrating monolayer MoS2 onto nanometer
wide gold nanogap arrays, it was possible to exploit the associated plasmon resonance,
thus enhancing photoluminescence by a factor 20x, and thus paving the way for successive
applications in photodetectors, sensors and emitters. Zhang J. et al. [2] studied another
hybrid metamaterial consisting in metal–graphene. Such a coupling gives rise to a sharper
Fano resonance than the pure graphene and it is, moreover, adjustable as a function of the
number of graphene layers. Plasmonic sensing applications with extremely high sensitivity
in the mid-infrared range are envisioned. Zhang L. et al. [3] showcase an interesting and
relatively unconventional application for graphene, i.e., lubrication for structural ceramics.
In particular, Si3N4/ Si3N4 sliding pair tribological properties (lubrication and cooling)
have been investigated through the addition of different weight contents of graphene to
a base lubricating oil. Relevant results have been obtained and an explanation about the
lubricating improvement mechanism was provided. In the last paper involving graphene,
Verna et al. [4] showed an original and straightforward process, based on the lift-off of the
catalyst seed layer, to pattern few-layer graphene. The direct chemical vapor deposition of
1](https://image.slidesharecdn.com/27623886-250517054233-9c666b6b/85/2d-Nanomaterials-Processing-And-Integration-In-Miniaturized-Devices-Matteo-Cocuzza-13-320.jpg)
![Micromachines 2021, 12, 254
graphene on the patterned seed layer guaranteed high quality of the resulting 2D material
and a 10 µm patterning resolution was demonstrated.
Volovlikova et al. [5] analyzed the effect of illumination intensity and p-dopant con-
centration on the dissolution properties of silicon for its photo-assisted etching with no
external bias or metals to produce porous silicon. A thorough characterization was per-
formed, providing valuable data for the control of porous silicon thickness and porosity.
Ruffino et al. [6] provided a valuable basic study on the growth and coalescence characteris-
tics of a nanoscale-thick bimetallic film of Au/Pd on a silicon carbide substrate. The kinetic
of the growth process was studied from the initial 3D clustering to the final continuous
rough thin film formation. Xiao et al. [7] performed a full comparison, with special atten-
tion to electrical resistivity and adhesion, between ink-jet-printed silver thin films based on
nanoparticle ink and metal–organic decomposition ink cured by two different approaches,
that is to say, UV exposure and heat-assisted approaches. Cao et al. [8] fabricated (through
a combination of lithography and nanoimprint technology) and characterized a flexible
3D display film element consisting of two integrated structures of a microimage array and
microlens array.
Finally, in their review article, Coluccio et al. [9] revised and critically described
nanoscale transport phenomena and biomedical applications of different emerging elec-
trochemical devices whose working principle relies on the interaction between ions and
conductive polymers.
Last, but not least, we would like to thank all the contributing authors and all the
involved reviewers for their precious contribution to the assembly and quality of this
Special Issue.
Conflicts of Interest: The authors declare no conflict of interest.
References
1. Yang, Y.; Pan, R.; Tian, S.; Gu, C.; Li, J. Plasmonic Hybrids of MoS2 and 10-nm Nanogap Arrays for Photoluminescence
Enhancement. Micromachines 2020, 11, 1109. [CrossRef] [PubMed]
2. Zhang, J.; Hong, Q.; Zou, J.; He, Y.; Yuan, X.; Zhu, Z.; Qin, S. Fano-Resonance in Hybrid Metal-Graphene Metamaterial and Its
Application as Mid-Infrared Plasmonic Sensor. Micromachines 2020, 11, 268. [CrossRef] [PubMed]
3. Zhang, L.; Wei, X.; Wang, J.; Wu, Y.; An, D.; Xi, D. Experimental Study on the Lubrication and Cooling Effect of Graphene in Base
Oil for Si3N4/Si3N4 Sliding Pairs. Micromachines 2020, 11, 160. [CrossRef] [PubMed]
4. Verna, A.; Marasso, S.; Rivolo, P.; Parmeggiani, M.; Laurenti, M.; Cocuzza, M. Lift-Off Assisted Patterning of Few Layers
Graphene. Micromachines 2019, 10, 426. [CrossRef] [PubMed]
5. Volovlikova, O.; Gavrilov, S.; Lazarenko, P. Influence of Illumination on Porous Silicon Formed by Photo-Assisted Etching of
p-Type Si with a Different Doping Level. Micromachines 2020, 11, 199. [CrossRef] [PubMed]
6. Ruffino, F.; Censabella, M.; Piccitto, G.; Grimaldi, M. Morphology Evolution of Nanoscale-Thick Au/Pd Bimetallic Films on
Silicon Carbide Substrate. Micromachines 2020, 11, 410. [CrossRef] [PubMed]
7. Xiao, P.; Zhou, Y.; Gan, L.; Pan, Z.; Chen, J.; Luo, D.; Yao, R.; Chen, J.; Liang, H.; Ning, H. Study of Inkjet-Printed Silver Films
Based on Nanoparticles and Metal-Organic Decomposition Inks with Different Curing Methods. Micromachines 2020, 11, 677.
[CrossRef] [PubMed]
8. Cao, A.; Xue, L.; Pang, Y.; Liu, L.; Pang, H.; Shi, L.; Deng, Q. Design and Fabrication of Flexible Naked-Eye 3D Display Film
Element Based on Microstructure. Micromachines 2019, 10, 864. [CrossRef] [PubMed]
9. Coluccio, M.; Pullano, S.; Vismara, M.; Coppedè, N.; Perozziello, G.; Candeloro, P.; Gentile, F.; Malara, N. Emerging Designs of
Electronic Devices in Biomedicine. Micromachines 2020, 11, 123. [CrossRef] [PubMed]
2](https://image.slidesharecdn.com/27623886-250517054233-9c666b6b/85/2d-Nanomaterials-Processing-And-Integration-In-Miniaturized-Devices-Matteo-Cocuzza-14-320.jpg)
![micromachines
Article
Plasmonic Hybrids of MoS2 and 10-nm Nanogap
Arrays for Photoluminescence Enhancement
Yang Yang 1,† , Ruhao Pan 1,†, Shibing Tian 1, Changzhi Gu 1,2 and Junjie Li 1,2,3,*
1 Beijing National Laboratory for Condensed Matter Physics, Institute of Physics,
Chinese Academy of Sciences, P.O. Box 603, Beijing 100190, China; yang.yang@iphy.ac.cn (Y.Y.);
panruhao@iphy.ac.cn (R.P.); tianshibing@iphy.ac.cn (S.T.); czgu@iphy.ac.cn (C.G.)
2 School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100049, China
3 Songshan Lake Materials Laboratory, Dongguan 523808, China
* Correspondence: jjli@iphy.ac.cn
† These authors contributed equally to this work.
Received: 17 October 2020; Accepted: 10 December 2020; Published: 15 December 2020
Abstract: Monolayer MoS2 has attracted tremendous interest, in recent years, due to its novel physical
properties and applications in optoelectronic and photonic devices. However, the nature of the
atomic-thin thickness of monolayer MoS2 limits its optical absorption and emission, thereby hindering
its optoelectronic applications. Hybridizing MoS2 by plasmonic nanostructures is a critical route
to enhance its photoluminescence. In this work, the hybrid nanostructure has been proposed by
transferring the monolayer MoS2 onto the surface of 10-nm-wide gold nanogap arrays fabricated using
the shadow deposition method. By taking advantage of the localized surface plasmon resonance
arising in the nanogaps, a photoluminescence enhancement of ~20-fold was achieved through
adjusting the length of nanogaps. Our results demonstrate the feasibility of a giant photoluminescence
enhancement for this hybrid of MoS2/10-nm nanogap arrays, promising its further applications in
photodetectors, sensors, and emitters.
Keywords: monolayer MoS2; 10-nm nanogap; localized surface plasmon resonance; photoluminescence
1. Introduction
In the past ten years, two-dimensional (2D) transition metal dichalcogenides (TMDs) have
received plenty of research interest, due to their striking physical properties and applications in
optoelectronic devices [1,2]. Molybdenum disulphide (MoS2) is a representative member of the
TMDs family [3,4], in which the bandgap can transit from indirect to direct [5,6], when the thickness
is reduced to a monolayer. The bandgap shifts from 1.29 eV for the bulk MoS2 to 1.9 eV for the
monolayer MoS2, accompanied with an enhancement of the photoluminescence (PL) up to 104 [5].
Therefore, the direct-bandgap characteristic of the monolayer MoS2 leads to attractive applications
in phototransistors [7], photodetectors [8], light emitters [9], and photocatalysis [10]. However,
the thickness of 2D MoS2 is too thin to absorb sufficient light, which limits the light-harvest efficiency
and consequently restricts its practical applications. Therefore, efficiently enhancing the light absorption
and photoluminescence (PL) emission of MoS2 has become an important issue for exploring the practical
applications in optoelectronic devices. In recent years, integrating MoS2 with plasmonic nanoscale
metals has been demonstrated to be an effective route to promote the optical properties of MoS2 [11–13].
Plasmonic nanoscale metals, including noble metal nanoparticles and nanostructures, can strongly
enhance the electromagnetic (EM) fields of the excitation light, due to the localized surface plasmon
resonance (LSPR) on the surface of nanoscale metals [14–16]. Gao et al. have prepared the hybrids
of MoS2 and Ag nanoparticles, including shape-controlled cubes, octahedra, and spherical particles,
3](https://image.slidesharecdn.com/27623886-250517054233-9c666b6b/85/2d-Nanomaterials-Processing-And-Integration-In-Miniaturized-Devices-Matteo-Cocuzza-15-320.jpg)
![Micromachines 2020, 11, 1109
and systematically studied the influences of the morphology of nanoparticles on the PL emission of
MoS2 [17]. Compared with nanoparticles, nanostructures fabricated using advanced nanofabrication
techniques exhibit higher controllability, reproducibility, and large-scale periodicity [18]. By modulating
the diameter of nanodiscs, the 12-times PL enhancement was achieved in the hybrids of nanodisc arrays
and monolayer MoS2 [19]. Among the various species of nanostructures, nanogaps have exhibited
a prominent PL enhancement due to the EM field and the strong LSPR effect in the nanogap zone.
The EM field intensity is strengthened as the nanogap size decreases, especially when the width of
nanogaps is smaller than 10 nm [20,21]. Wang et al. reported a giant PL enhancement up to 20,000-fold
for the hybrid of WSe2 on 12-nm nanotrenches [22]. In 2018, Cai et al. proposed a hybrid of MoSe2 on
large area ultranarrow annular nanogap arrays (ANAs), which were fabricated using atomic layer
deposition and polystyrene spheres lithography techniques [23]. Nanofabrication techniques, such as
E-beam lithography (EBL) and focused ion beam (FIB) milling have been explored to directly fabricate
10-nm nanogap arrays [24–26]. However, the fabrication processes based on these techniques are
relatively complex, due to fact that the small size of the nanogap is close to the limitation of resolution.
In 2018, Hao et al. proposed a hybrid of MoS2 and patterned plasmonic dimers fabricated by a facile
approach utilizing porous anodic aluminium oxide (AAO) templates during the angle-resolved shadow
deposition [27]. The shadow deposition method, which is based on the inclined deposition of materials
on the prefabricated pattern, has been demonstrated as a feasible way to fabricate 10-nm nanogap
arrays over a large area [28,29]. However, the MoS2 hybrids based on 10-nm nanogap arrays fabricated
by the shadow deposition method is still rarely reported.
In this work, a type of plasmonic hybrid composed of 10-nm Au nanogap arrays and monolayer
MoS2 was proposed for PL enhancement. The 10-nm Au nanogap arrays were fabricated using
the shadow deposition method, which was composed by depositing nanostrips with a 20 degree
inclining angle on the nanostrips previously fabricated. By adjusting the length of nanogaps, the PL
enhancement can be significantly boosted up to ~20-fold for the MoS2/nanogaps hybrid formed with
240-nm-length nanogaps under the excitation of a 532-nm laser. Combined with the finite-different
time-domain (FDTD) simulation, the mechanism behind the PL enhancement was analyzed. Our results
provide a feasible method to prepare large area MoS2-nanostructure plasmonic hybrids with a giant
photoluminescence enhancement, promising their further applications in photodetectors, sensors,
and emitters.
2. Materials and Methods
The monolayer MoS2 used in this work was fabricated on a single-crystalline sapphire substrate
using the chemical vapor deposition (CVD) method [30]. The 10-nm nanogap arrays were fabricated
using the shadow deposition method, a combination of EBL and electron beam deposition (EBD)
techniques. Figure 1 illustrates the fabrication processes for the hybrid of MoS2 and nanogap arrays,
which mainly include six steps. First, as presented in Figure 1a, a polymethyl methacrylate (PMMA)
495 A5 layer with a 200-nm thickness was spin coated onto the Si substrate, and the film was pre-baked
on a hot plate at 180 ◦C for 60 s. Then, the EBL was used to write the patterns of nanostrips along the
y-axis. Third, metallic nanostrips can be transferred by EBD on a 60-nm Au film and followed lift-off
processes. After that, the nanostrips with a 60-nm-height were observed, as presented in Figure 1d.
Fourth, the nanostrips along the x-axis were written by the alignment lithography, as illustrated in
Figure 1e. Then, the shadow deposition of Au with a 20 degree inclining angle was applied to the Au
strips formed in step 3, the thickness of Au was also 60-nm in the shadow deposition process, as shown
in Figure 1f. Since the shadow origins from the deposition angle and steps, 10-nm nanogaps can be
obtained, as illustrated in Figure 1g. Finally, the MoS2 was transferred on top of the nanogap arrays,
forming a plasmonic MoS2/nanogaps hybrid, as shown in Figure 1h. The MoS2 flake was removed
from the substrate to Au nanogap arrays using a PMMA-assisted wet transfer procedure, which has
been applied to transfer 2D materials [22,31]. In order to investigate the plasmonic enhancement effect
of the Au nanogaps on the PL emission of MoS2, another type of MoS2-nanogaps hybrid, in which
4](https://image.slidesharecdn.com/27623886-250517054233-9c666b6b/85/2d-Nanomaterials-Processing-And-Integration-In-Miniaturized-Devices-Matteo-Cocuzza-16-320.jpg)
2d Nanomaterials Processing And Integration In Miniaturized Devices Matteo Cocuzza
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- 5. 2D Nanomaterials Processing and Integration in Miniaturized Devices
- 7. 2D Nanomaterials Processing and Integration in Miniaturized Devices Editors Matteo Cocuzza Fabrizio Pirri MDPI • Basel • Beijing • Wuhan • Barcelona • Belgrade • Manchester • Tokyo • Cluj • Tianjin
- 8. Editors Matteo Cocuzza Department of Applied Science and Technology Politecnico di Torino Torino Italy Fabrizio Pirri Department of Applied Science and Technology Politecnico di Torino Torino Italy Editorial Office MDPI St. Alban-Anlage 66 4052 Basel, Switzerland This is a reprint of articles from the Special Issue published online in the open access journal Micromachines (ISSN 2072-666X) (available at: www.mdpi.com/journal/micromachines/special issues/Nanomaterials Processing Integration). For citation purposes, cite each article independently as indicated on the article page online and as indicated below: LastName, A.A.; LastName, B.B.; LastName, C.C. Article Title. Journal Name Year, Volume Number, Page Range. ISBN 978-3-0365-1570-0 (Hbk) ISBN 978-3-0365-1569-4 (PDF) © 2021 by the authors. Articles in this book are Open Access and distributed under the Creative Commons Attribution (CC BY) license, which allows users to download, copy and build upon published articles, as long as the author and publisher are properly credited, which ensures maximum dissemination and a wider impact of our publications. The book as a whole is distributed by MDPI under the terms and conditions of the Creative Commons license CC BY-NC-ND.
- 9. Contents About the Editors . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . vii Candido Fabrizio Pirri and Matteo Cocuzza Editorial for the Special Issue on 2D Nanomaterials Processing and Integration in Miniaturized Devices Reprinted from: Micromachines 2021, 12, 254, doi:10.3390/mi12030254 . . . . . . . . . . . . . . . . 1 Yang Yang, Ruhao Pan, Shibing Tian, Changzhi Gu and Junjie Li Plasmonic Hybrids of MoS2 and 10-nm Nanogap Arrays for Photoluminescence Enhancement Reprinted from: Micromachines 2020, 11, 1109, doi:10.3390/mi11121109 . . . . . . . . . . . . . . . 3 Lixiu Zhang, Xiaoyi Wei, Junhai Wang, Yuhou Wu, Dong An and Dongyang Xi Experimental Study on the Lubrication and Cooling Effect of Graphene in Base Oil for Si3N4/Si3N4 Sliding Pairs Reprinted from: Micromachines 2020, 11, 160, doi:10.3390/mi11020160 . . . . . . . . . . . . . . . . 15 Alessio Verna, Simone Luigi Marasso, Paola Rivolo, Matteo Parmeggiani, Marco Laurenti and Matteo Cocuzza Lift-Off Assisted Patterning of Few Layers Graphene Reprinted from: Micromachines 2019, 10, 426, doi:10.3390/mi10060426 . . . . . . . . . . . . . . . . 23 Jianfa Zhang, Qilin Hong, Jinglan Zou, Yuwen He, Xiaodong Yuan, Zhihong Zhu and Shiqiao Qin Fano-Resonance in Hybrid Metal-Graphene Metamaterial and Its Application as Mid-Infrared Plasmonic Sensor Reprinted from: Micromachines 2020, 11, 268, doi:10.3390/mi11030268 . . . . . . . . . . . . . . . . 35 Francesco Ruffino, Maria Censabella, Giovanni Piccitto and Maria Grazia Grimaldi Morphology Evolution of Nanoscale-Thick Au/Pd Bimetallic Films on Silicon Carbide Substrate Reprinted from: Micromachines 2020, 11, 410, doi:10.3390/mi11040410 . . . . . . . . . . . . . . . . 43 Peng Xiao, Yicong Zhou, Liao Gan, Zhipeng Pan, Jianwen Chen, Dongxiang Luo, Rihui Yao, Jianqiu Chen, Hongfu Liang and Honglong Ning Study of Inkjet-Printed Silver Films Based on Nanoparticles and Metal-Organic Decomposition Inks with Different Curing Methods Reprinted from: Micromachines 2020, 11, 677, doi:10.3390/mi11070677 . . . . . . . . . . . . . . . . 55 Olga Volovlikova, Sergey Gavrilov and Petr Lazarenko Influence of Illumination on Porous Silicon Formed by Photo-Assisted Etching of p-Type Si with a Different Doping Level Reprinted from: Micromachines 2020, 11, 199, doi:10.3390/mi11020199 . . . . . . . . . . . . . . . . 67 Axiu Cao, Li Xue, Yingfei Pang, Liwei Liu, Hui Pang, Lifang Shi and Qiling Deng Design and Fabrication of Flexible Naked-Eye 3D Display Film Element Based on Microstructure Reprinted from: Micromachines 2019, 10, 864, doi:10.3390/mi10120864 . . . . . . . . . . . . . . . . 83 Maria Laura Coluccio, Salvatore A. Pullano, Marco Flavio Michele Vismara, Nicola Coppedè, Gerardo Perozziello, Patrizio Candeloro, Francesco Gentile and Natalia Malara Emerging Designs of Electronic Devices in Biomedicine Reprinted from: Micromachines 2020, 11, 123, doi:10.3390/mi11020123 . . . . . . . . . . . . . . . . 93 v
- 11. About the Editors Matteo Cocuzza Matteo Cocuzza got his M.D. in Electronic Engineering from Politecnico di Torino, Turin, Italy, in 1997, and his Ph.D. degree in Electronic Devices in 2003. He is currently a Professor at the Dept. of Applied Science and Technology of Politecnico di Torino and associated researcher of IMEM-CNR. In 1998, he was one of the founders of the Chilab-Materials and Microsystems Laboratory. He is currently a lecturer of master’s degree courses related to MEMS, micro- and nano-technologies, also in the framework of the International Master Degree in Nanotechnologies for ICT (joined master between Politecnico di Torino, INPG Grenoble and EPFL Lausanne). His research activity is focused on MEMS and microsensors for industrial applications, on the development of microfluidics and lab-on-a-chip for biomedical applications and, more recently, on the development and application of polymeric 3-D printing technologies. Fabrizio Pirri Candido Fabrizio Pirri is Full Professor at the Dept. of Applied Science and Technology of Politecnico di Torino and Responsible for the Chilab-Materials and Microsystems Laboratory since 1998. He joined the Center for Sustainable Future Technologies, Istituto Italiano di Tecnologia, Genova, Italy, as Director in 2011. Since 2005, he has been Director of the National MIUR Excellence Laboratory “Latemar”, whose mission is the development of advanced technologies for genomics and proteomics. He is a lecturer of courses on physics of matter and introduction to nanotechnologies with Politecnico di Torino. vii
- 13. micromachines Editorial Editorial for the Special Issue on 2D Nanomaterials Processing and Integration in Miniaturized Devices Candido Fabrizio Pirri 1,2,* and Matteo Cocuzza 1,3,* Citation: Pirri, C.F.; Cocuzza, M. Editorial for the Special Issue on 2D Nanomaterials Processing and Integration in Miniaturized Devices. Micromachines 2021, 12, 254. https:// doi.org/10.3390/mi12030254 Received: 25 February 2021 Accepted: 1 March 2021 Published: 2 March 2021 Publisher’s Note: MDPI stays neutral with regard to jurisdictional claims in published maps and institutional affil- iations. Copyright: © 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https:// creativecommons.org/licenses/by/ 4.0/). 1 Department of Applied Science and Technology (DISAT), Politecnico di Torino, C.so Duca degli Abruzzi 24, 10129 Turin, Italy 2 Center for Sustainable Future Technologies, Istituto Italiano di Tecnologia, Via Livorno 60, 10144 Turin, Italy 3 Institute of Materials for Electronics and Magnetism, IMEM-CNR, Parco Area delle Scienze 37/A, 43124 Parma, Italy * Correspondence: fabrizio.pirri@polito.it (C.F.P.); matteo.cocuzza@infm.polito.it (M.C.) Initially considered little more than a scientific curiosity, the family of 2D nanomateri- als has become increasingly popular over the last decade. Starting from the undisputed progenitor, i.e., graphene, which to date has reached a technological maturity and a criti- cal mass of knowledge to allow envisaging multiple applications in real manufacturing, numerous other materials have progressively been added to this family: transition metal dichalcogenides, boron nitride, metal oxide nanosheets, MXenes, layered double hydrox- ides, etc. Similarly, the range of applications under study and development has expanded, integrating and taking advantage of the unique properties of 2D nanostructured materials: sensors, optical applications, photovoltaics, touch screens, catalysis, filtration and exploita- tion as fillers to modulate the mechanical, electrical and chemical properties of the host matrices. Such a plethora of material/application combinations, in addition to the obvious technical requirements related to the synthesis of materials and the optimization of purity, composition, morphology and yield, also presents significant technological challenges for the corresponding processing, patterning and above all integration into systems and devices of higher dimensionality for the real exploitation of their unique properties. The present Special Issue is then focused on such last topics, collecting eight research papers and one review article dealing with MoS2 [1], graphene [2–4] and other 2D nanomaterials integrated onto several kinds of materials and structures (nanogap [1], porous silicon [5], silicon carbide [6]) and for different applications (photoluminescence [1], ink-jet printing [7], optics and plasmonics [2,8], lubrication [3], innovative patterning [4], biomedicine [9]). In particular, Yang et al. [1] proposed an innovative solution to bypass the limitation of the atomic thickness of monolayer MoS2 hindering its optical absorption and emission in view of optoelectronic applications. By integrating monolayer MoS2 onto nanometer wide gold nanogap arrays, it was possible to exploit the associated plasmon resonance, thus enhancing photoluminescence by a factor 20x, and thus paving the way for successive applications in photodetectors, sensors and emitters. Zhang J. et al. [2] studied another hybrid metamaterial consisting in metal–graphene. Such a coupling gives rise to a sharper Fano resonance than the pure graphene and it is, moreover, adjustable as a function of the number of graphene layers. Plasmonic sensing applications with extremely high sensitivity in the mid-infrared range are envisioned. Zhang L. et al. [3] showcase an interesting and relatively unconventional application for graphene, i.e., lubrication for structural ceramics. In particular, Si3N4/ Si3N4 sliding pair tribological properties (lubrication and cooling) have been investigated through the addition of different weight contents of graphene to a base lubricating oil. Relevant results have been obtained and an explanation about the lubricating improvement mechanism was provided. In the last paper involving graphene, Verna et al. [4] showed an original and straightforward process, based on the lift-off of the catalyst seed layer, to pattern few-layer graphene. The direct chemical vapor deposition of 1
- 14. Micromachines 2021, 12, 254 graphene on the patterned seed layer guaranteed high quality of the resulting 2D material and a 10 µm patterning resolution was demonstrated. Volovlikova et al. [5] analyzed the effect of illumination intensity and p-dopant con- centration on the dissolution properties of silicon for its photo-assisted etching with no external bias or metals to produce porous silicon. A thorough characterization was per- formed, providing valuable data for the control of porous silicon thickness and porosity. Ruffino et al. [6] provided a valuable basic study on the growth and coalescence characteris- tics of a nanoscale-thick bimetallic film of Au/Pd on a silicon carbide substrate. The kinetic of the growth process was studied from the initial 3D clustering to the final continuous rough thin film formation. Xiao et al. [7] performed a full comparison, with special atten- tion to electrical resistivity and adhesion, between ink-jet-printed silver thin films based on nanoparticle ink and metal–organic decomposition ink cured by two different approaches, that is to say, UV exposure and heat-assisted approaches. Cao et al. [8] fabricated (through a combination of lithography and nanoimprint technology) and characterized a flexible 3D display film element consisting of two integrated structures of a microimage array and microlens array. Finally, in their review article, Coluccio et al. [9] revised and critically described nanoscale transport phenomena and biomedical applications of different emerging elec- trochemical devices whose working principle relies on the interaction between ions and conductive polymers. Last, but not least, we would like to thank all the contributing authors and all the involved reviewers for their precious contribution to the assembly and quality of this Special Issue. Conflicts of Interest: The authors declare no conflict of interest. References 1. Yang, Y.; Pan, R.; Tian, S.; Gu, C.; Li, J. Plasmonic Hybrids of MoS2 and 10-nm Nanogap Arrays for Photoluminescence Enhancement. Micromachines 2020, 11, 1109. [CrossRef] [PubMed] 2. Zhang, J.; Hong, Q.; Zou, J.; He, Y.; Yuan, X.; Zhu, Z.; Qin, S. Fano-Resonance in Hybrid Metal-Graphene Metamaterial and Its Application as Mid-Infrared Plasmonic Sensor. Micromachines 2020, 11, 268. [CrossRef] [PubMed] 3. Zhang, L.; Wei, X.; Wang, J.; Wu, Y.; An, D.; Xi, D. Experimental Study on the Lubrication and Cooling Effect of Graphene in Base Oil for Si3N4/Si3N4 Sliding Pairs. Micromachines 2020, 11, 160. [CrossRef] [PubMed] 4. Verna, A.; Marasso, S.; Rivolo, P.; Parmeggiani, M.; Laurenti, M.; Cocuzza, M. Lift-Off Assisted Patterning of Few Layers Graphene. Micromachines 2019, 10, 426. [CrossRef] [PubMed] 5. Volovlikova, O.; Gavrilov, S.; Lazarenko, P. Influence of Illumination on Porous Silicon Formed by Photo-Assisted Etching of p-Type Si with a Different Doping Level. Micromachines 2020, 11, 199. [CrossRef] [PubMed] 6. Ruffino, F.; Censabella, M.; Piccitto, G.; Grimaldi, M. Morphology Evolution of Nanoscale-Thick Au/Pd Bimetallic Films on Silicon Carbide Substrate. Micromachines 2020, 11, 410. [CrossRef] [PubMed] 7. Xiao, P.; Zhou, Y.; Gan, L.; Pan, Z.; Chen, J.; Luo, D.; Yao, R.; Chen, J.; Liang, H.; Ning, H. Study of Inkjet-Printed Silver Films Based on Nanoparticles and Metal-Organic Decomposition Inks with Different Curing Methods. Micromachines 2020, 11, 677. [CrossRef] [PubMed] 8. Cao, A.; Xue, L.; Pang, Y.; Liu, L.; Pang, H.; Shi, L.; Deng, Q. Design and Fabrication of Flexible Naked-Eye 3D Display Film Element Based on Microstructure. Micromachines 2019, 10, 864. [CrossRef] [PubMed] 9. Coluccio, M.; Pullano, S.; Vismara, M.; Coppedè, N.; Perozziello, G.; Candeloro, P.; Gentile, F.; Malara, N. Emerging Designs of Electronic Devices in Biomedicine. Micromachines 2020, 11, 123. [CrossRef] [PubMed] 2
- 15. micromachines Article Plasmonic Hybrids of MoS2 and 10-nm Nanogap Arrays for Photoluminescence Enhancement Yang Yang 1,† , Ruhao Pan 1,†, Shibing Tian 1, Changzhi Gu 1,2 and Junjie Li 1,2,3,* 1 Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, P.O. Box 603, Beijing 100190, China; yang.yang@iphy.ac.cn (Y.Y.); panruhao@iphy.ac.cn (R.P.); tianshibing@iphy.ac.cn (S.T.); czgu@iphy.ac.cn (C.G.) 2 School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100049, China 3 Songshan Lake Materials Laboratory, Dongguan 523808, China * Correspondence: jjli@iphy.ac.cn † These authors contributed equally to this work. Received: 17 October 2020; Accepted: 10 December 2020; Published: 15 December 2020 Abstract: Monolayer MoS2 has attracted tremendous interest, in recent years, due to its novel physical properties and applications in optoelectronic and photonic devices. However, the nature of the atomic-thin thickness of monolayer MoS2 limits its optical absorption and emission, thereby hindering its optoelectronic applications. Hybridizing MoS2 by plasmonic nanostructures is a critical route to enhance its photoluminescence. In this work, the hybrid nanostructure has been proposed by transferring the monolayer MoS2 onto the surface of 10-nm-wide gold nanogap arrays fabricated using the shadow deposition method. By taking advantage of the localized surface plasmon resonance arising in the nanogaps, a photoluminescence enhancement of ~20-fold was achieved through adjusting the length of nanogaps. Our results demonstrate the feasibility of a giant photoluminescence enhancement for this hybrid of MoS2/10-nm nanogap arrays, promising its further applications in photodetectors, sensors, and emitters. Keywords: monolayer MoS2; 10-nm nanogap; localized surface plasmon resonance; photoluminescence 1. Introduction In the past ten years, two-dimensional (2D) transition metal dichalcogenides (TMDs) have received plenty of research interest, due to their striking physical properties and applications in optoelectronic devices [1,2]. Molybdenum disulphide (MoS2) is a representative member of the TMDs family [3,4], in which the bandgap can transit from indirect to direct [5,6], when the thickness is reduced to a monolayer. The bandgap shifts from 1.29 eV for the bulk MoS2 to 1.9 eV for the monolayer MoS2, accompanied with an enhancement of the photoluminescence (PL) up to 104 [5]. Therefore, the direct-bandgap characteristic of the monolayer MoS2 leads to attractive applications in phototransistors [7], photodetectors [8], light emitters [9], and photocatalysis [10]. However, the thickness of 2D MoS2 is too thin to absorb sufficient light, which limits the light-harvest efficiency and consequently restricts its practical applications. Therefore, efficiently enhancing the light absorption and photoluminescence (PL) emission of MoS2 has become an important issue for exploring the practical applications in optoelectronic devices. In recent years, integrating MoS2 with plasmonic nanoscale metals has been demonstrated to be an effective route to promote the optical properties of MoS2 [11–13]. Plasmonic nanoscale metals, including noble metal nanoparticles and nanostructures, can strongly enhance the electromagnetic (EM) fields of the excitation light, due to the localized surface plasmon resonance (LSPR) on the surface of nanoscale metals [14–16]. Gao et al. have prepared the hybrids of MoS2 and Ag nanoparticles, including shape-controlled cubes, octahedra, and spherical particles, 3
- 16. Micromachines 2020, 11, 1109 and systematically studied the influences of the morphology of nanoparticles on the PL emission of MoS2 [17]. Compared with nanoparticles, nanostructures fabricated using advanced nanofabrication techniques exhibit higher controllability, reproducibility, and large-scale periodicity [18]. By modulating the diameter of nanodiscs, the 12-times PL enhancement was achieved in the hybrids of nanodisc arrays and monolayer MoS2 [19]. Among the various species of nanostructures, nanogaps have exhibited a prominent PL enhancement due to the EM field and the strong LSPR effect in the nanogap zone. The EM field intensity is strengthened as the nanogap size decreases, especially when the width of nanogaps is smaller than 10 nm [20,21]. Wang et al. reported a giant PL enhancement up to 20,000-fold for the hybrid of WSe2 on 12-nm nanotrenches [22]. In 2018, Cai et al. proposed a hybrid of MoSe2 on large area ultranarrow annular nanogap arrays (ANAs), which were fabricated using atomic layer deposition and polystyrene spheres lithography techniques [23]. Nanofabrication techniques, such as E-beam lithography (EBL) and focused ion beam (FIB) milling have been explored to directly fabricate 10-nm nanogap arrays [24–26]. However, the fabrication processes based on these techniques are relatively complex, due to fact that the small size of the nanogap is close to the limitation of resolution. In 2018, Hao et al. proposed a hybrid of MoS2 and patterned plasmonic dimers fabricated by a facile approach utilizing porous anodic aluminium oxide (AAO) templates during the angle-resolved shadow deposition [27]. The shadow deposition method, which is based on the inclined deposition of materials on the prefabricated pattern, has been demonstrated as a feasible way to fabricate 10-nm nanogap arrays over a large area [28,29]. However, the MoS2 hybrids based on 10-nm nanogap arrays fabricated by the shadow deposition method is still rarely reported. In this work, a type of plasmonic hybrid composed of 10-nm Au nanogap arrays and monolayer MoS2 was proposed for PL enhancement. The 10-nm Au nanogap arrays were fabricated using the shadow deposition method, which was composed by depositing nanostrips with a 20 degree inclining angle on the nanostrips previously fabricated. By adjusting the length of nanogaps, the PL enhancement can be significantly boosted up to ~20-fold for the MoS2/nanogaps hybrid formed with 240-nm-length nanogaps under the excitation of a 532-nm laser. Combined with the finite-different time-domain (FDTD) simulation, the mechanism behind the PL enhancement was analyzed. Our results provide a feasible method to prepare large area MoS2-nanostructure plasmonic hybrids with a giant photoluminescence enhancement, promising their further applications in photodetectors, sensors, and emitters. 2. Materials and Methods The monolayer MoS2 used in this work was fabricated on a single-crystalline sapphire substrate using the chemical vapor deposition (CVD) method [30]. The 10-nm nanogap arrays were fabricated using the shadow deposition method, a combination of EBL and electron beam deposition (EBD) techniques. Figure 1 illustrates the fabrication processes for the hybrid of MoS2 and nanogap arrays, which mainly include six steps. First, as presented in Figure 1a, a polymethyl methacrylate (PMMA) 495 A5 layer with a 200-nm thickness was spin coated onto the Si substrate, and the film was pre-baked on a hot plate at 180 ◦C for 60 s. Then, the EBL was used to write the patterns of nanostrips along the y-axis. Third, metallic nanostrips can be transferred by EBD on a 60-nm Au film and followed lift-off processes. After that, the nanostrips with a 60-nm-height were observed, as presented in Figure 1d. Fourth, the nanostrips along the x-axis were written by the alignment lithography, as illustrated in Figure 1e. Then, the shadow deposition of Au with a 20 degree inclining angle was applied to the Au strips formed in step 3, the thickness of Au was also 60-nm in the shadow deposition process, as shown in Figure 1f. Since the shadow origins from the deposition angle and steps, 10-nm nanogaps can be obtained, as illustrated in Figure 1g. Finally, the MoS2 was transferred on top of the nanogap arrays, forming a plasmonic MoS2/nanogaps hybrid, as shown in Figure 1h. The MoS2 flake was removed from the substrate to Au nanogap arrays using a PMMA-assisted wet transfer procedure, which has been applied to transfer 2D materials [22,31]. In order to investigate the plasmonic enhancement effect of the Au nanogaps on the PL emission of MoS2, another type of MoS2-nanogaps hybrid, in which 4
- 17. Micromachines 2020, 11, 1109 the nanogap arrays were fabricated directly on the CVD-grown MoS2 on the sapphire substrate (nanogaps/MoS2) was fabricated for comparison. Figure 1. Schematic fabrication procedures of the MoS2/Au nanogap hybrid. (a) Substrate coated with polymethyl methacrylate (PMMA). (b) Nanotranches formed after the first E-beam lithography (EBL) process. (c) First Au deposition process. (d) Au nanostrips obtained after lift-off process. (e) Nanotrenches formed after the second EBL process. (f) The second Au shadow deposition process. (g) Nanogaps obtained by crossover of nanostrips. (h) Hybrid structure formed after MoS2 transferred. An enlarged view of the nanogap obtained was illustrated in the middle. The morphology and dimensions of the fabricated Au nanogaps are detected using a scanning electron microscope (SEM). Figure 2a presents the SEM images of the fabricated 10-nm Au nanogap arrays with a periodicity of 1 µm. It can clearly be seen that the nanogaps formed on the right side on each cubic island. Since the nanogaps were formed as a result of the shadow of first-layer nanostrips, the width of the nanogap obviously depended on the inclining angle for the deposition of the second-layer nanostrips. As exhibited in Figure 2b, the gap width widens with increasing the inclined deposition angle. The 10-nm nanogaps have been successfully fabricated by fixing the inclining angle at 20 degrees, as shown in Figure 2c. The length of this nanogap was determined as ~240 nm, since the line-width of the nanostrips was set at 240 nm. Therefore, the length of the nanogaps can be feasibly modulated by adjusting their line-width. Figure 2d shows the SEM image of the monolayer MoS2 transferred onto the nanogap arrays. It can be seen that the nanogap arrays are fully covered with the MoS2 monolayer. Photoluminescence (PL) and Raman measurements were carried on a micro-confocal Raman spectrometer (Horiba HR Evolution) equipped with a microscope (BX41, Olympus, Tokyo, Japan). A 100 × (NA = 0.9) objective lens was used for focusing the laser on the sample surface and collecting the PL signal. The 532-nm laser was used as the excitation sources for PL measurements and the laser power on the sample was about 0.5 mW in order to prevent the overheating effect. The spectra acquisition time was 30 and 10 s for Raman and PL acquisition, respectively. Figure 3a exhibits the schematic setup of the PL measurements on the MoS2/nanogap hybrids. As illustrated in Figure 3a, the laser beam was a normal incident on the sample surface, and the polarization direction of the 5
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- 19. THE DOMINEERING MALE. Loew's Inc., c1940. Presented by Metro-Goldwyn-Mayer. 944 ft., sd., bw. (A Pete Smith Specialty) Credits: Story and direction, John Hines; film editor, Philip Anderson. © Loew's Inc.; 13Mar40; LP9569. THE DOMINION OF SPORTS. Released by Warner Bros., c1946. 10 min., sd., color, 35mm. (The Sports Parade) Credits: Director, Van Campen Heilner; narrator, Knox Manning. Technicolor. © The Vitaphone Corp.; 1Oct46; MP1185. THE DON COSSACK CHORUS. Warner Bros. Pictures, Inc., c1942. 10 min., sd. (Melody Masters Band) Credits: Director, Jean Negulesco. © Warner Bros. Pictures, Inc.; 25Apr42; MP12408. DON JUAN QUILLIGAN. Twentieth Century-Fox Film Corp., c1945. 6,780 ft., sd. From a story by Herbert C. Lewis. Credits: Director, Frank Tuttle; screenplay, Arthur Kober, Frank Gabrielson; music director, Emil Newman. © Twentieth Century-Fox Film Corp.; 13Jun45; LP13382. DON MCNEILL; 1941 Easter ham short. Presented by Swift Co. sd., color. Credits: Technicolor. Appl. author: Jam Handy Picture Service, Inc. © Swift Co.; title descr., 27Mar41; 44 prints, 28Mar41; MU10990.
- 20. DON RICARDO RETURNS. c1946. Presented by P.R.C. Pictures, Inc. 7 reels, sd., 35mm. Credits: Producer, J. S. Burkett; director, T. O. Morse; original story, Johnston McCully; screenplay, Jack De Witt, Renault Duncan; music, Alexander Steinert; film editor, George McGuire. © Pathe Industries, Inc,; 5Nov46; LP686. DON WINSLOW OF THE COAST GUARD. Universal Pictures Co., Inc., c1942–43. 2 reels each, sd. Based on the newspaper feature Don Winslow of the Navy. © Universal Pictures Co., Inc. Credits: Associate producer, Henry MacRae; directors, Ray Taylor, Lewis D. Collins; screenplay, Paul Huston, Griffin Jay, George H. Plympton; musical director, H. J. Salter; photography, William Sickner, John Boyle; editors, Al Todd, Irving Birnbaum, Edgar Zane. 1. Trapped in the Blazing Sea. © 22Dec42; LP11748. 2. Battling a U-Boat! © 22Dec42; LP11749. 3. The Crash in the Clouds. © 22Dec42; LP11750. 4. The Scorpion Strikes. © 29Jan43; LP11823. 5. A Flaming Target. © 29Jan43; LP11824. 6. Ramming the Submarine. © 29Jan43; LP11825. 7. Bombed in the Ocean Depths. © 5Feb43; LP11849. 8. Blackout Treachery. © 5Feb43; LP11850. 9. The Torpedo Strikes. © 5Feb43; LP11851. 10. Blasted from the Skies. © 5Feb43; LP11852. 11. A Fight to the Death. © 27Apr43; LP12182. 12. The Death Trap. © 27Apr43; LP12211. 13. Capturing the Scorpion! © 27Apr43; LP12208. DON WINSLOW OF THE NAVY. Universal Pictures Co., Inc., c1941. 2 reels each (no. 1, 3 reels). © Universal Pictures Co., Inc. Credits: Directors, Ford Beebe, Ray Taylor; screenplay, Paul Huston, Griffin Jay; screen adaptation, Morgan B. Cox.
- 21. 1. The Human Torpedo. © 24Oct41; LP10798. 2. Flaming Death! © 29Oct41; LP10804. 3. Weapons of Horror! © 29Oct41; LP10805. 4. Towering Doom. © 18Nov41; LP10820. 5. Trapped in the Dungeon! © 19Nov41; LP10821. 6. Menaced by Man-Eaters! © 25Nov41; LP10844. 7. Bombed by the Enemy! © 5Dec41; LP10874. 8. The Chamber of Doom. © 16Dec41; LP10904. 9. Wings of Destruction. © 16Dec41; LP10905. 10. Fighting Fathoms Deep! © 24Dec41; LP10937. 11. Caught in the Caverns. © 24Dec41; LP10938. 12. The Scorpion Strangled! © 24Dec41; LP10939. DONALD DUCK AND THE GORILLA. Walt Disney Productions, c1944. 1 reel. (A Walt Disney Donald Duck) © Walt Disney Productions; 11Feb44; LP12702. DONALD GETS DRAFTED. Walt Disney Productions, c1942. 1 reel, sd., color. (A Walt Disney Donald Duck) © Walt Disney Productions; 27Jan42; LP11166. DONALD'S CAMERA. Walt Disney Productions, c1941. 1 reel, sd. (A Walt Disney Donald Duck) © Walt Disney Productions; 18Jul41; LP10730. DONALD'S CRIME. Distributed by RKO Radio Pictures, Inc., c1945. 1 reel, sd., color. (A Walt Disney Donald Duck) Credits: Director, Jack King; story, Ralph Wright; animation, Paul Allen, Don Towsley, Josh Meador, Harvey Toombs; music, Edward Plumb. Technicolor. © Walt Disney Productions; 1Jan45; LP13211.
- 22. DONALD'S DILEMMA. Walt Disney Productions, c1947. 7 min., sd., color, 35mm. Credits: Director, Jack King; story, Roy Williams; animation, Don Towsley, Emery Hawkins, Ed Aardal, Sandy Strother; music, Oliver Wallace. © Walt Disney Productions; 13Mar47; LP1118. DONALD'S DOG LAUNDRY. Walt Disney Productions, c1940. 1 reel. (A Walt Disney Donald Duck) © Walt Disney Productions; 15Feb40; LP9504. DONALD'S DOUBLE TROUBLE. Walt Disney Productions, c1946. 1 reel, sd. (A Walt Disney Donald Duck) Credits: Director, Jack King; story, Roy Williams; animation, Don Towsley, Fred Kopietz, Tom Massey, Sandy Strother; music, Oliver Wallace. © Walt Disney Productions; 3Apr46; LP336. DONALD'S DREAM VOICE. Walt Disney Productions, c1947. 1 reel, sd., color, 35mm. (Donald Duck Cartoon) Credits: Director, Jack King; story, Roy Williams; animation, Ed Aardal, Paul Allen, Emery Hawkins, Frank McSavage; music, Oliver Wallace. © Walt Disney Productions; 23Jul47; LP1719. DONALD'S GARDEN. Walt Disney Productions, c1942. 1 reel, sd. (A Walt Disney Donald Duck) © Walt Disney Productions; 21Jan42; LP11288. DONALD'S GOLD MINE. Walt Disney Productions, c1942. 1 reel, sd. (A Walt Disney Donald Duck) © Walt Disney Productions; 19Feb42; LP11428.
- 23. DONALD'S HAPPY BIRTHDAY. Walt Disney Productions, c1948. 1 reel, sd., color, 35mm. (Donald Duck Cartoon) Credits: Director, Jack Hannah; story, Nick George, Bill Berg; animation, Bob Carlson, Bill Justice, Volus Jones, Jack Boyd; music, Oliver Wallace. © Walt Disney Productions; 30Jan48; LP1983. DONALD'S OFF DAY. Distributed by RKO Radio Pictures Inc., c1944. 1 reel, sd., color. (A Walt Disney Donald Duck) Credits: Director, Jack Hannah; story, Bill Berg, Dick Shaw; animation, Judge Whitaker, Harvey Toombs, Art Scott, John Reed; music, Paul J. Smith. Technicolor. © Walt Disney Productions; 21Sep44; LP13133. DONALD'S SNOW FIGHT. Walt Disney Productions, c1942. 1 reel, sd. (A Walt Disney Donald Duck) © Walt Disney Productions; 15Jan42; LP11167. DONALD'S TIRE TROUBLE. Walt Disney Productions, c1942. 1 reel, sd. (A Walt Disney Donald Duck) © Walt Disney Productions; 24Aug42; LP11870. DONALD'S VACATION. Walt Disney Productions, c1940. 1 reel. (A Walt Disney Donald Duck) © Walt Disney Productions; 21Jun40; LP9867. DONOVAN'S BRAIN. SEE The Lady and the Monster. DON'T BE A BABY, BABY. Soundies Distributing Corp. of America, Inc., c1946. 1 reel, sd. Credits: Producer and director, William Forest Crouch.
- 24. © Soundies Distributing Corp. of America, Inc.; 22Jul46; MP897. DON'T BE A JOE. Presented by Rhythm Shorts, Inc. sd., bw, 35mm. Appl. author: Hal Seeger. © Rhythm Shorts, Inc.; title, descr., 11 prints, 8May47; MU1994. DON'T BE AN ABSENTEE. Soundies Distributing Corp. of America, Inc., c1943. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 20Sep43; MP13962. DON'T BE LATE. Soundies Distributing Corp. of America, Inc., c1945. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 23Apr45; MP15867. DON'T BLAME ME. Soundies Distributing Corp. of America, Inc., c1945. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 5Mar45; MP15659. DON'T BRING YOUR BLUES TO ME. Video Varieties Corp. 3 min., sd., bw, 35mm. Summary: Shorty Warren and his six-piece cowboy orchestra play and sing Don't Bring Your Blues to Me. © Video Varieties Corp.; title descr., 13Sep49; 3 prints, 18May49; MU4523.
- 25. DON'T CHANGE YOUR JOB. Soundies Distributing Corp. of America, Inc., c1943. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 31Dec43; MP14445. DON'T CRY. Soundies Distributing Corp. of America, Inc., c1941. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 1Feb41; MP11124. DON'T CRY BABY. Soundies Distributing Corp. of America, Inc., c1944. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 22May44; MP14860. DON'T FENCE ME IN. c1945. Presented by Republic Pictures. 8 reels, sd. Credits: Associate producer, Donald H. Brown; director, John English; original screenplay, Dorrell McGowan, Stuart E. McGowan; music director, Morton Scott; orchestral arrangements, Dale Butts; photographer, William Bradford; film editor, Charles Craft. Appl. author: Republic Productions, Inc. © Republic Pictures Corp.; 11Oct45; LP13524. DON'T FOOL YOUR WIFE. RKO Radio Pictures, Inc., c1948. 18 min., sd., bw, 35mm. Credits: Producer, George Bilson; direction and screenplay, Charles E. Roberts; film editor, Edward W. Williams. Cast: Leon Errol, Dorothy Granger, Steven Flagg, Suzi Crandall, Lotte Stein. © RKO Radio Pictures, Inc.; 5Mar48; LP1566.
- 26. DON'T GAMBLE WITH STRANGERS. Monogram Pictures Corp., c1946. 7 reels, sd., 35mm. Credits: Producer, Jeffrey Bernerd; director, William Beaudine; screenplay, Caryl Coleman, Harvey Gates; photographer, William Sickner; film editor, William Austin. © Monogram Pictures Corp.; 27May46; LP340. DON'T GET AROUND MUCH ANY MORE. Soundies Distributing Corp. of America, Inc., c1943. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 23Aug43; MP13855. DON'T GET PERSONAL. Universal Pictures Co., Inc., c1942. 6 reels, sd. Credits: Director, Charles Lamont; original story, Bernard Feins; screenplay, Hugh Wedlock, Jr., Howard Snyder. © Universal Pictures Co., Inc.; 2Jan42; LP10936. DON'T LET JULIA FOOL YA. Soundies Distributing Corp. of America, Inc., c1942. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 26Jan42; MP12145. DON'T LIE. Loew's Inc., c1942. Presented by Metro-Goldwyn- Mayer. 985 ft., sd., bw. Credits: Director, Edward Cahn; screenplay, Hal Law, Robert McGowan; film editor, Leon Bourgeau. © Loew's Inc.; 14Apr42; LP11296. DON'T RUN DOWN A WOMAN. Soundies Distributing Corp. of America, Inc., c1941. 1 reel, sd. Credits: Director, Warren Murray.
- 27. © Soundies Distributing Corp. of America, Inc.; 29Sep41; MP11627. DON'T SIT UNDER THE APPLE TREE. Soundies Distributing Corp. of America, Inc., c1942. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 8Jun42; MP12652. DON'T SQUEEZA DA BANANA. Soundies Distributing Corp. of America, Inc., c1945. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 20Aug45; MP16222. DON'T TAKE IT TO HEART. Two Cities Films, Ltd., London, c1944. Released in the U. S. through Eagle Lion Films, Inc., 1949. 90 min., sd., bw, 35mm. Summary: A bomb hit on an English castle releases a 16th century ghost who, with the help of a young lawyer, straightens out a dispute between a landowner and the villagers. A satirical comedy on the English nobility. Credits: Producer, Sydney Box; written and directed by Jeffrey Dell; music, Mischa Spoliansky; film editor, Frederick Wilson. Cast: Richard Greene, Patricia Medina, Wylie Watson, Brefni O'Rorke, Edward Rigby. © General Film Distributors, Ltd.; 15Nov44; LP2532. DON'T TALK. Loew's Inc., c1942. Presented by Metro-Goldwyn- Mayer. 1,960 ft., sd., bw. (A Crime Does Not Pay Subject) Credits: Director, Joe Newman; original story and screenplay, Alan Friedman; film editor, Harry Komer. © Loew's Inc.; 12Mar42; LP11363. DON'T TRUST YOUR HUSBAND. SEE An Innocent Affair.
- 28. DON'T YOU BELIEVE IT. Loew's Inc., c1943. Presented by Metro- Goldwyn-Mayer. 940 ft., sd., bw. (John Nesbitt's Passing Parade) Based on an idea by Cran Chamberlin. Credits: Director, Edward Cahn; screenplay, Gene Piller; music score, Max Terr, Nathaniel Shilkret; film editor, Harry Komer. © Loew's Inc.; 1Jul43; LP12142. DON'TS FOR DIGGERS. Motion Picture Bureau, Affiliated Aetna Life Companies, c1944. 1 reel, sd. Appl. author: F. W. Bright. © Affiliated Aetna Life Companies; 1Apr44; MP14815. THE DOOLINS OF OKLAHOMA. Producers-Actors Corp. Released through Columbia Pictures Corp., c1949. 90 min., sd., bw, 35mm. Summary: A Western about the lawless exploits of the Doolin gang. Credits: Producer, Harry Joe Brown; director, Gordon Douglas; screenplay, Kenneth Gamet; music score, Paul Sawtell; music director, M. W. Stoloff; film editor, Charles Nelson. Cast: Randolph Scott, George Macready, Louise Allbritton, John Ireland, Virginia Huston. © Producers Actors Corp.; 7Jul49; LP2384. DOOMED CARAVAN. Paramount Pictures Inc., c1941. 6 reels, sd. Based on characters created by Clarence E. Mulford. Credits: Producer, Harry Sherman; director, Lesley Selander; screenplay, Johnston McCulley, J. Benton Cheney; photography, Russell Harlan; film editor, Carrol Lewis. © Paramount Pictures Inc.; 10Jan41; LP10167. DOOMED TO DIE. Monogram Pictures Corp., c1940. 8 reels, sd. Based on the James Lee Wong series by Hugh Wiley.
- 29. Credits: Producer, Paul Malvern; director, William Nigh; original story, Ralph Bettinson; screenplay, Michel Jacoby; photography, Harry Neumann; film editor, Robert Golden. © Monogram Pictures Corp.; 19Jul40; LP9855. THE DOOR TO HEAVEN. C. O. Baptista, c1941. 1 reel, 16mm. © C. O. Baptista; 30Jan41; MP10799. A DOOR WILL OPEN. Loew's Inc., c1939. Presented by Metro- Goldwyn-Mayer. 984 ft., sd., bw. (A Carey Wilson Miniature) Credits: Director, George Sidney; original story, Chandler Sprague; screenplay, Julian Hochfelder; music director, David Snell; film editor, Adrienne Fazan. © Loew's Inc.; 29Dec39; LP9500. DOPING TECHNIQUE. U. S. Navy. © Jam Handy Picture Service, Inc.; title descr., 21Jan42; 88 prints, 15Jan42; MU12056. DOT-DOT-DOT-DASH. Soundies Distributing Corp, of America, Inc., c1943. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 19Jul43; MP13742. DOUBLE ALIBI. Universal Pictures Co., Inc., c1940, 6 reels. Based on a story by Frederick C. Davis. Credits: Director, Philip Rosen; screenplay, Harold Buchman, Roy Chanslor, Charles Grayson. © Universal Pictures Co., Inc.; 16Feb40; LP9432. DOUBLE BARRELLED SPORT. Paramount Pictures Inc., c1948. 10 min., sd., bw, 35mm. (Grantland Rice Sportlight)
- 30. Summary: Hunting Pintail ducks along the Columbia River in Oregon, and hunting Ringneck pheasants with Ralph Bellamy at Sun Valley, Idaho. Credits: Associate producers, Russel T. Ervin, Rod Warren; narrators. Bill Slater, Ralph Bellamy. © Paramount Pictures Inc.; 20Feb48; MP2733. THE DOUBLE CARRICK BEND. Presented by United States Navy. sd., bw. © Jam Handy Organization, Inc.; title descr., 25Feb44; 9 prints, 21Feb44; MU14518. DOUBLE CHASER. c1942. 1 reel, sd. (Merrie Melodies) Leon Schlesinger Productions. Credits: Producer, Leon Schlesinger; story, Michael Maltese; animation, Gerry Chiniquy; music director, Carl W. Stalling. © The Vitaphone Corp.; 27Jun42; MP12625. DOUBLE CROSS. Producers Releasing Corp., c1941. 7 reels, sd. Credits: Producer, John G. Bachmann; director, Albert Kelley; original story, John A. Albert; screenplay, Milton Raison, Ron Ferguson; photography, Arthur Martinelli. © Producers Releasing Corp.; 27Jun41; LP10578. DOUBLE DATE. c1941. Presented by Universal Studios. 7 reels, sd. Credits: Associate producer, Joseph G. Sanford; director, Glenn Tryon; original story, Scott Darling, Erna Lazarus; screenplay, Scott Darling, Erna Lazarus, Agnes Christine Johnston; music director, Charles Previn; photography, John Boyle; film editor, Otto Ludwig. © Universal Pictures Co., Inc.; 13Mar41; LP10320.
- 31. DOUBLE DRIBBLE. Walt Disney Productions, c1946. 7 min., sd., color, 35mm. Credits: Director, Jack Hannah; story, Bill Berg, Milt Banta; animation, Bill Justice, Hugh Fraser, John Sibley, Andy Engman; music, Oliver Wallace. © Walt Disney Productions; 25Jul46; LP1122. DOUBLE EAGLE. Soundies Distributing Corp of America, Inc., c1945. 1 reel, sd. © Soundies Distributing Corp. of America, Inc.; 25Jun45; MP16105. DOUBLE EXPOSURE. Paramount Pictures, Inc., c1944. 7 reels, sd. Based on an original story by Ralph Graves and Winston Miller. Credits: Producers, William H. Pine, William C. Thomas; director, William Berks; screenplay, Winston Miller, Maxwell Shane; editor, Henry Adams. © Paramount Pictures Inc,; 15Dec44; LP13176. DOUBLE HONEYMOON. RKO Radio Pictures, Inc., c1945. 18 min., sd. Credits: Producer, George Bilson; director, Hal Yates; screenplay, George Jeske, Hal Yates; film editor, Lyle Boyer. © RKO Radio Pictures, Inc.; 3Aug45; LP13663. DOUBLE INDEMNITY. Paramount Pictures Inc., c1944. 9,596 ft., sd. From the novel by James M. Cain. Credits: Director, Billy Wilder; screenplay, Billy Wilder, Raymond Chandler; music score, Miklos Rozsa. © Paramount Pictures Inc.; 21Apr44; LP12748. A DOUBLE LIFE. Universal Pictures Co., Inc., c1948. 103 min., sd., bw, 35mm. A Kanin production.
- 32. Summary: Reality and illusion become indistinguishable in the mind of an actor playing the part of Othello. After strangling an offstage sweetheart he returns to the theatre and stabs himself fatally during a performance. Credits: Producer, Michael Kanin; director, George Cukor; script, Ruth Gordon, Garson Kanin; music, Miklos Rozsa; film editor, Robert Parrish. Cast: Ronald Colman, Signe Hasso, Edmond O'Brien, Shelley Winters, Ray Collins. © Universal Pictures Co., Inc., and Kanin Productions; 8Mar48; LP1706. DOUBLE OR NOTHING. The Vitaphone Corp., c1939. 20 min., sd. (Broadway Brevity) Credits: Director, Roy Mack; written by Cyrus D. Wood, Eddie Forman. © The Vitaphone Corp.; 23Dec39; LP9560. DOUBLE RHYTHM. Paramount Pictures Inc., c1946. 1,706 ft., sd., color, 35mm. (A Paramount Musical Parade Featurette) Based on a story by Franz Rosenwald. Credits: Director, George B. Templeton; screenplay, Franz Rosenwald, Frank Tashlin; music director, Irvin Talbot; film editor, Helene Turner. Technicolor. © Paramount Pictures Inc.; 20Jun46; LP562. THE DOUBLE TAKE. SEE I Love Trouble. DOUBLE TALK GIRL. Universal Pictures Co., Inc., c1942. 1 reel, sd. (Person-Oddity, no. 114) Credits: Producers, Joseph O'Brien, Thomas Mead; narrator, Tiny Ruffner. © Universal Pictures Co., Inc.; 23Oct42; MP12988.
- 33. DOUBLE TROUBLE. Monogram Pictures Corp., c1941. 7 reels, sd. Credits: Producer, Dixon R. Harwin; director, William West; screenplay, Jack Natteford; photography, A. Martinelli; film editor, Carl Pierson. © Monogram Pictures Corp.; 21Nov41; LP10915. DOUBLE UP. RKO Radio Pictures, Inc., c1943. 18 min., sd. Credits: Producer, Bert Gilroy; director, Ben Holmes; story, Joe Cunningham; film editor, Robert Swink. © RKO Radio Pictures, Inc.; 29Jan43; LP12158. DOUBTFUL DOLLARS. Motion Picture Bureau, Aetna Casualty and Surety Company for the United States Secret Service, Treasury Dept., c1945. 2 reels, sd. Appl. author: Stanley F. Withe. © Aetna Casualty and Surety Co.; 1Mar45; MP16035. DOUGH FOR THE DO-DO. Warner Bros. Cartoons, Inc., c1949. 7 min., sd., color, 35mm. (Merrie Melodies) Credits: Voice characterizations, Mel Blanc; music director, Carl Stalling. © The Vitaphone Corp.; 30Aug49 (in notice: 1948); MP4502. DOUGH RAY ME-OW. Warner Bros. Cartoons, Inc., c1948. 7 min., sd., color, 35mm. (Merrie Melodies) Credits: Director, Arthur Davis; story, Lloyd Turner; animation, Basil Davidovich, J. C. Melendez, Don Williams, Emery Hawkins. © The Vitaphone Corp.; 19Aug48; MP3247. DOUGHBOYS IN IRELAND. Columbia Pictures Corp., c1943. 7 reels, sd.
- 34. Credits: Producer, Jack Fier; director, Lew Landers; original screenplay, Howard J. Green; music director, M. W. Stoloff; film editor, Mel Thorsen. © Columbia Pictures Corp.; 7Oct43; LP12307. THE DOUGHGIRLS. Warner Bros. Pictures, Inc., c1944. 102 min., sd. A Warner Bros.-First National picture. From the stage play by Joseph Fields. Credits: Producer, Mark Hellinger; director, James V. Kern; screenplay, James V. Kern and Sam Hellman; photographer, Ernest Haller; film editor, Folmer Blangsted. © Warner Bros. Pictures, Inc.; 23Nov44; LP12958. DOWN ARGENTINE WAY. Twentieth Century-Fox Film Corp., c1940. 8,500 ft., sd. Credits: Director, Irving Cummings; story, Rian James, Ralph Spence; screenplay, Darrell Ware, Karl Tunberg; music director, Emil Newman. © Twentieth Century-Fox Film Corp.; 11Oct40; LP10260. DOWN DAKOTA WAY. Republic Productions, Inc., c1949. 67 min., sd., color, 35mm. Summary: A Western in which Roy Rogers foils a plot to market diseased cattle. Credits: Associate producer, Edward J. White; director, William Witney; written by John K. Butler, Sloan Nibley; music, R. Dale Butts; film editor, Tony Martinelli. Cast: Roy Rogers, Dale Evans, Pat Brady, Montie Montana, Elisabeth Risdon. © Republic Pictures Corp.; 8Sep49; LP2530. DOWN, DOWN, DOWN. Soundies Distributing Corp. of America, Inc., c1942. 1 reel, sd.
- 35. © Soundies Distributing Corp. of America, Inc.; 31Dec42; MP13351. DOWN IN SAN DIEGO. Loew's Inc., c1941. Presented by Metro- Goldwyn-Mayer. 7 reels, sd., bw. Based on a story by Franz G. Spencer. Credits: Producer, Frederick Stephani; director, Robert B. Sinclair; screenplay, Harry Clork, Franz G. Spencer; music score, David Snell; film editor, Ben Lewis. © Loew's Inc.; 23Jul41; LP10627. DOWN MEMORY LANE. Eagle Lion Films, Inc., c1949. 73 min., sd., bw, 35mm. Summary: A revue presenting a series of musical acts and comedy sequences clipped from early Mack Sennett silent and sound pictures. Credits: Producer, Aubrey Schenck; director, Phil Karlson. © Pathe Industries, Inc.; 12Aug49; LP2605. DOWN MEXICO WAY. c1941. Presented by Republic Pictures. 8 reels, sd. Based on a story by Dorrell and Stuart McGowan. Credits: Associate producer, Harry Grey; director, Joseph Santley; screenplay, Olive Cooper, Albert Duffy; photographer, Jack Marta; film editor, Howard O'Neill. Appl. author: Republic Productions, Inc. © Republic Pictures Corp.; 15Oct41; LP10801. DOWN MISSOURI WAY. c1946. 8 reels, sd., 35mm. Credits: Director, Joseph Berne; original screenplay, Sam Neuman. Appl. author: P.R.C. Pictures, Inc. © Pathe Industries, Inc.; 1Aug46; LP455.
- 36. DOWN ON THE FARM. Presented by Chevrolet. Color. Appl. author: Jam Handy Picture Service, Inc. © Chevrolet Motor Division, General Motors Sales Corp.; title descr., 28Oct40; 60 prints, 30Oct40; MU10589. DOWN RIO GRANDE WAY. Columbia Pictures Corp., c1942. 6 reels, sd. Credits: Producer, Jack Fier; director, William Berke; original screenplay, Paul Franklin; film editor, Mel Thorsen. © Columbia Pictures Corp.; 25Mar42; LP11159. DOWN SINGAPORE WAY. The Vitaphone Corp., c1946. 20 min., sd., color, 35mm. Credits: Directed and written by Deane Dickason; narrator, Knox Manning. Technicolor. © The Vitaphone Corp.; 16Jun46; MP1024. DOWN TEXAS WAY. Monogram Pictures Corp., c1942. 6 reels, sd. Credits: Producer, Scott R. Dunlap; director, Howard P. Bretherton; original screenplay, Jess Bowers; photography, Harry Neumann; film editor, Carl Pierson. © Monogram Pictures Corp.; 29May42; LP11394. DOWN THE FAIRWAY. Twentieth Century-Fox Film Corp., c1945. 1 reel, sd., color. (Ed Thorgersen's Sports Review) Credits: Producer, Edmund Reek; music score, L. deFrancesco; photographer, Jack Painter; film editor, Russ Sheilds. Technicolor. © Twentieth Century-Fox Film Corp.; 1Jun45; MP16114. DOWN THE NILE. Vitaphone Corp., c1949. 20 min., sd., color, 35mm. Warner Bros.
- 37. Summary: A tour along the banks of the Nile River from the Congo regions to the Mediterranean Sea, including scenes of Cairo, the temples of Karnak, the Egyptian obelisks, the temple of Ramses, King Tut's tomb, the Sphinx, and the giant pyramids. Credits: Supervisor, Gordon Hollingshead; written by Owen Crump; narrator, Art Gilmore; editor, Marshall Eyanson. © Vitaphone Corp.; 5Aug49; MP4378. DOWN THE TRAIL TO SAN ANTONE. Soundies Distributing Corp. of America, Inc., c1946. 1 reel, sd. Credits: Director, Dave Gould. © Soundies Distributing Corp. of America, Inc.; 8Apr46; MP427. DOWN TO EARTH. Columbia Pictures Corp., c1947. 101 min., sd., color, 35mm. With three characters from Here Comes Mr. Jordan a motion picture based on Harry Segall's drama Heaven Can Wait. Credits: Producer, Don Hartman; director, Alexander Hall; original screenplay, Edwin Blum, Don Hartman; music director, M. W. Stoloff; film editor, Viola Lawrence. Cast: Rita Hayworth, Larry Parks, James Gleason, Edward Everett Horton. © Columbia Pictures Corp.; 17Jul47; LP1089. DOWN TO THE SEA IN SHIPS. Twentieth Century-Fox Film Corp., c1949. 120 min., sd., bw, 35mm. An adaptation of the 1922 motion picture of the same title. Summary: A story of adventure on a New Bedford whaling ship in 1887. Shipped as a cabin boy, the captain's school-aged grandson learns the traditions and disciplines of seafaring life under the sympathetic tutelage of the young first mate and the harsh command of the captain.
- 38. Credits: Producer, Louis D. Lighton; director, Henry Hathaway; story, Sy Bartlett; screenplay, John Lee Mahin, Sy Bartlett; music director, Alfred Newman; film editor, Dorothy Spencer. Cast: Richard Widmark, Lionel Barrymore, Dean Stockwell, Cecil Kellaway, Gene Lockhart. © Twentieth Century-Fox Film Corp.; 16Feb49; LP2443. THE DRAFT HORSE. c1942. 1 reel, sd. (Merrie Melodies) Leon Schlesinger Productions. Credits: Producer, Leon Schlesinger; story, Ted Pierce; animation, Robert Cannon; music director, Carl W. Stalling. © The Vitaphone Corp.; 23May42; MP12503. DRAFTED IN THE DEPOT. RKO Radio Pictures, Inc., c1941. 19 min., sd. Credits: Producer, Lou Brock; director, Lloyd French; story, Lloyd French, Arthur Jones. © RKO Radio Pictures, Inc.; 20Jan41; LP10220. DRAFTEE DAFFY. Warner Bros. Cartoons, Inc., c1944. 7 min., sd., color. (Looney Tunes) Credits: Director, Robert Clampett; story, Lou Lilly; animation, Emanuel Gould; music director, Carl W. Stalling. Technicolor. © The Vitaphone Corp.; 26Dec44; MP15747. DRAFTING TIPS. The Pennsylvania State College Extension Services. c1943. 1 reel, sd., 16mm. Appl. author: Kenneth L. Holderman. © The Pennsylvania State College; 26May43; MP13628.
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