Filter filtration products Intro liquid and air

Editor's Notes

• #8: The key value proposition for POU applications are; Retention Upgrade - for applications experiencing particle problems or for a new process that needs better filtration. The key here is that we can provide a 0.1 um filter with the same or better flow as a competitor 0.2, or a 0.1 vs. a 0.45, or our 0.05 um vs. a 0.1 um Higher Flow to provide faster recirc bath clean up – this is usually limited by the customer’s system and bath design. Even if all the potential flow is not realized the system will operate at a lower differential pressure, which is a benefit especially for chemical delivery systems. Reduced cost – this is mostly for large flow and multi-filter applications like Ni Plating, but chemical delivery systems may also be another area See the next slide for the other important value proposition – potential for longer filter life.
• #11: As you have heard in the last presentation, one of the main application of Gore Microfiltration Media is for Semiconductor manufacturing. The Filtration of particles is very important here because of the very small features that are being manufactured into the wafer surface as shown in this schematic here. The linewidth between neighboring features is becoming smaller and smaller and that is why more memory can be stored on chips and why processors run faster. The linewidth can be less than 100 nm. Particles that are trapped between neighboring features as shown in this micrograph can cause a short and a defect in the wafer. Here is another picture of a particle which is trapped between two raised features leading to a defective chip. The size of these defect causing particles can be as small as 50 nm. It is very important that our filtration media filter these particles to a very low concentration.