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Pressure Sensor Theory
 Two Main Types of Pressure Sensors
Capacitive Sensors
• Work based on measurement of
capacitance from two parallel
plates.
• C = εA/d , A = area of plates d =
distance between.
• This implies that the response of a
capacitive sensor is inherently
non-linear. Worsened by
diaphragm deflection.
• Must use external processor to
compensate for non-linearity
Pressure Sensor Theory
Piezoresistive Sensors
 Work based on the
piezoresistive properties of
silicon and other materials.
 Piezoresistivity is a response to
stress.
 Some piezoresistive materials
are Si, Ge, metals.
 In semiconductors,
piezoresistivity is caused by 2
factors: geometry deformation
and resistivity changes.
Pressure Sensor Theory
 Our Sensor is a
Piezoresistive
Sensor based on a
Wheatstone Bridge
Configuration.
 Resistors are made
with Boron Diffusion.
Pressure Sensor Process
Overview
 Initial Wafer is 525
µm thick, n-type,
<100> double-side
polished (DSP).
Pressure Sensor Process
Overview – Step 2
 Thermal Oxidation
 Wet Oxidation
Followed by Dry
Oxidation Si + O2 → SiO2 (Dry Oxidation)
Si + 2H2O2 → SiO2 (Wet Oxidation)
Pressure Sensor Process
Overview – Step 3
 Photolithography for
Piezoresistive Elements
 Contact Lithography
Si + O2 → SiO2 (Dry Oxidation)
Si + 2H2O2 → SiO2 (Wet Oxidation)
Pressure Sensor Process
Overview – Step 3 Cont.
 DNQ Method using
Mercury Lamp
 Diazonap. Changes to
carboxylic acid via Wolf
re-arrangement
 Carboxylic Acid is more
soluble in a base than
Novolak. So exposed
areas dissolve.
 Use TMAH (a base)
mixture to develop
Pressure Sensor Process
Overview – Step 4 - Diffusion
 Creates Resistors in
Substrate
 Three Methods
1. Solid Evap. (Tetramethyl
Borate, Boron Nitride) - Rare
2. Gaseous – Diborane (B2H6) –
Dangerous!! 160 ppm for 15
min life threatening
3. Liquid – Borosilicate polymer
in ethanol. Creates
borosilicate glass, boron
oxide, and unused boron.
5 Squares
1 Square
3
Squares
Ref: Jaeger, Richard. “Introduction to Microelectronic Fabrication”
Pressure Sensor Process
Overview – Wafer Testing
5 Squares
1 Square
3
Squares
R=lw/xj
Rs=/xj
R=(squares)/xj
Contacts Equivalent: Rs=0.65 squares
Resistive Element: 6.3 squares

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Pressure Sensor Lecture introduction and working

  • 1. Pressure Sensor Theory  Two Main Types of Pressure Sensors Capacitive Sensors • Work based on measurement of capacitance from two parallel plates. • C = εA/d , A = area of plates d = distance between. • This implies that the response of a capacitive sensor is inherently non-linear. Worsened by diaphragm deflection. • Must use external processor to compensate for non-linearity
  • 2. Pressure Sensor Theory Piezoresistive Sensors  Work based on the piezoresistive properties of silicon and other materials.  Piezoresistivity is a response to stress.  Some piezoresistive materials are Si, Ge, metals.  In semiconductors, piezoresistivity is caused by 2 factors: geometry deformation and resistivity changes.
  • 3. Pressure Sensor Theory  Our Sensor is a Piezoresistive Sensor based on a Wheatstone Bridge Configuration.  Resistors are made with Boron Diffusion.
  • 4. Pressure Sensor Process Overview  Initial Wafer is 525 µm thick, n-type, <100> double-side polished (DSP).
  • 5. Pressure Sensor Process Overview – Step 2  Thermal Oxidation  Wet Oxidation Followed by Dry Oxidation Si + O2 → SiO2 (Dry Oxidation) Si + 2H2O2 → SiO2 (Wet Oxidation)
  • 6. Pressure Sensor Process Overview – Step 3  Photolithography for Piezoresistive Elements  Contact Lithography Si + O2 → SiO2 (Dry Oxidation) Si + 2H2O2 → SiO2 (Wet Oxidation)
  • 7. Pressure Sensor Process Overview – Step 3 Cont.  DNQ Method using Mercury Lamp  Diazonap. Changes to carboxylic acid via Wolf re-arrangement  Carboxylic Acid is more soluble in a base than Novolak. So exposed areas dissolve.  Use TMAH (a base) mixture to develop
  • 8. Pressure Sensor Process Overview – Step 4 - Diffusion  Creates Resistors in Substrate  Three Methods 1. Solid Evap. (Tetramethyl Borate, Boron Nitride) - Rare 2. Gaseous – Diborane (B2H6) – Dangerous!! 160 ppm for 15 min life threatening 3. Liquid – Borosilicate polymer in ethanol. Creates borosilicate glass, boron oxide, and unused boron. 5 Squares 1 Square 3 Squares Ref: Jaeger, Richard. “Introduction to Microelectronic Fabrication”
  • 9. Pressure Sensor Process Overview – Wafer Testing 5 Squares 1 Square 3 Squares R=lw/xj Rs=/xj R=(squares)/xj Contacts Equivalent: Rs=0.65 squares Resistive Element: 6.3 squares