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Overview of Silicon Semiconductor
Technology
Module 1 – CMOS Technology
Module 1 – CMOS Technology
Learning Outcome
Learning Outcome
 Students will be able to illustrate the processing steps
in silicon semiconductor technology
Lecture 1 - Overview of Silicon
Semiconductor Technology 2
Course Outcome (CO1)
 Students will be able to Familiarize the process involved in
fabrication of CMOS Technology
Basic Planar Processes
Basic Planar Processes
Processes used to fabricate IC
Processes used to fabricate IC
Silicon Wafer (Substrate) Preparation
Epitaxial Growth
Oxidation
Photolithography
Diffusion
Ion Implantation
Isolation Technique
Metallization
Assembly Processing and Packaging
Silicon Wafer Preparation
Silicon Wafer Preparation
Czochralski Crystal Growth
Czochralski Crystal Growth
Silicon Ingot & Ingot Slicing
Silicon Ingot & Ingot Slicing
Wafer Polishing and Etching
Wafer Polishing and Etching
Unit1_Lecture1_Basic Planar Processes.ppt
Epitaxial Growth
Epitaxial Growth
Oxidation
Oxidation
Si + 2H2O SiO2 + 2H2
Photolithography
Photolithography
Diffusion
Diffusion
Ion Implantation
Ion Implantation
Isolation Techniques
Isolation Techniques
PN Junction Isolation
Dielectric Isolation
PN Junction Isolation
PN Junction Isolation
Dielectric Isolation
Dielectric Isolation
Metallization
Metallization
Aluminium is used in metallization due to
following reasons:
It is a good conductor.
Easy to deposit using aluminium films
using vacuum deposition
It makes good mechanical bonds with
silicon
It forms low resistance contact with p type
Si and heavily doped n-type Si.
Vacuum Evaporation
Vacuum Evaporation
Assembly Processing and Packaging
Assembly Processing and Packaging
Assembly Processing and Packaging
Assembly Processing and Packaging

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Unit1_Lecture1_Basic Planar Processes.ppt