Ch28 microelectronic devices Erdi Karaçal Mechanical Engineer University of Gaziantep

Chapter 28
Fabrication of Microelectronic Devices
Manufacturing, Engineering & Technology, Fifth Edition, by Serope Kalpakjian and Steven R. Schmid.
ISBN 0-13-148965-8. © 2006 Pearson Education, Inc., Upper Saddle River, NJ. All rights reserved.

Parts Made by Chapter 28 Processes
(a) (b) (c)
Figure 28.1 (a) A completed eight-inch wafer with completed dice. (b) A single
chip in a ball-grid array (BGA) with cover removed. (c) A printed circuit board.
Source: Courtesy of Intel Corporation.

Fabrication of Integrated
Circuits
Figure 28.2 Outline of the general
fabrication sequence for integrated
circuits.

Fabrication of MOS Transistor
Figure 28.3 Cross-sectional views of the fabrication of a MOS transistor.
Source: After R. C. Jaeger.

Allowable Particle Size Counts for Clean Rooms
Figure 28.4 Allowable particle size counts for different clean room classes.

Crystallographic Structure and Miller Indices for Silicon
Figure 28.5 Crystallographic structure and Miller indices for silicon. (a) Construction
of a diamond-type lattice from interpenetrating face-centered cubic-cells; one of eight
penetrating cells is shown. (b) Diamond-type lattice of silicon; the interior atoms have
been shaded darker than the surface atoms. (c) Miller indices for a cubic lattice.

Finishing Operations on a
Silicon Ingot to Produce
Wafers
Figure 28.6 Finishing operations on a
silicon ingot to produce wafers (a)
sawing the ends off the ingot; (b)
grinding of the end and cylindrical
surfaces of a silicon ingot; (c) machining
of a notch or flat; (d) slicing of wafers;
(e) end grinding of wafers; (f) chemical-mechanical
polishing of wafers.

CVD Diagrams
Figure 28.7 Schematic diagrams of (a) a continuous, atmospheric-pressure
CVD reactor and (b) a low-pressure CVD. Source: After S. M. Sze.

Silicon Dioxide Growth
Figure 28.8 Growth of silicon dioxide showing consumption of silicon.
Source: After S. M. Sze.

General Characteristics of Lithography Techniques
Figure 28.9 Comparison of lithography
techniques.

Spinning of Organic Coating on Wafer
Figure 28.10 Spinning of an organic coating on a wafer.

Techniques of Pattern Transfer
Figure 28.11 Schematic illustration of (a) wafer stepper technique
to pattern transfer and (b) step-and-scan technique.

Pattern Transfer by Photolithography
Figure 28.12 Pattern transfer by photolithography. Note that the
mask in Step 3 can be a positive or negative image of the pattern.

SCALPEL Process
Figure 28.13 Schematic illustration of the SCALPEL process.

Moore’s Law
Figure 28.14 Illustration of Moore’s law. Source: After M. Madou.

General Characteristics of Silicon Etching
Operations

Comparison of Etch Rates

Etching Directionality
Figure 28.15 Etching directionality. (a) Isotropic etching: etch proceeds vertically
and horizontally at approximately the same rate, with significant mask undercut. (b)
Orientation-dependant etching (ODE): etch proceeds vertically, terminating on {111}
crystal planes with little mask undercut. (c) Vertical etching: etch proceed vertically
with little mask undercut. Source: Courtesy of K. R. Williams, Agilent Laboratories.

Etch Rates of Silicon
Figure 28.16 Etch rates of silicon in
different crystallographic orientations using
ethylene-diamine/pyrocatechol-in-water as
the solution. Source: After Seidel, H. et
al., Journal Electrochemical Society, 1990,
pp. 3612-3626.

Application of Boron Etch Stop and Back Etching
to Form Membrane and Orifice
Figure 28.17 Application of a boron etch stop and back etching to
form a membrane and orifice. Source: After Brodie, I., and Murray,
J.J., The Physics of Microfabrication, Plenum Press, 1982.

Machining Profiles Associated with Dry-Etching
Figure 28.18 Machining profiles associated with different dry-etching techniques:
(a) sputtering; (b) chemical; (c) ion-enhanced energetic; (d) ion-enhanced inhibitor.
Source: After M Madou.

Etching
Figure 28.19 (a) Schematic illustration of reactive plasma etching. (b) Examples of deep
reactive-ion etched trench. Note the periodic undercuts or scallops. (c) Near-vertical
sidewalls produced through DRIE with an anisotropic-etching process. (d) An examples of
cryogenic dry etching showing a 145-μm deep structure etched into silison using a 2.0- μm
thick oxide masking layer. The substrate temperature was -140°C during etching. Source:
(a) After M. Madou. (d) After R. Kassing and I.W. Rangelow, University of Kassel, Germany.

Holes Generated from Square Mask
Figure 28.20 Various holes generated from a square mask in: (a) isotropic (wet)
etching; (b) orientation-dependant etching (ODE); (c) ODE with a larger hole; (d)
ODE with a rectangular hole; (e) deep reactive-ion etching; and (f) vertical
etching. Source: After M. Madou.

Ion Implantation Apparatus
Figure 28.21 Schematic illustration for an apparatus for ion implantation.

PN-Junction Diode
Fabrication
Figure 28.22 Fabrication
sequence for a pn-diode.

Interconnection of Integrated Circuit Hierarchy
Figure 28.23 Connections between elements in the hierarchy for integrated circuits.

Two-Level Metal Interconnect Structures
Figure 18.24 (a) Scanning electron microscope (SEM) photograph of a two-level metal
interconnect. Note the varying surface topography. (b) Schematic illustration of a two-level
metal interconnect structure. Source: (a) Courtesy of National Semiconductor
Corporation. (b) After R. C. Jaeger.

Wire Bonds Connecting Package Leads to
Die Bonding Pads
(a) (b) (c)
Figure 18.25 (a) SEM photograph of wire bonds connecting
package leads (left-hand side) to die bonding pads. (b) and (c)
Detailed views of (a). Source: Courtesy of Micron Technology, Inc.

Thermosonic Welding of Gold Wires
Figure 28.26 Schematic illustration of thermosonic welding
of gold wires from package leads to bonding pads.

IC Packages
Figure 28.27 Schematic illustration of various IC packages:
(a) dual-in-line package (DIP); (b) flat, ceramic package; (c)
common surface-mount configurations; (d) ball-grid arrays.

Flip-Chip Technology
Figure 28.28 Illustration of flip-chip technology. Flip-chip package with
(a) solder-plated metal balls and pads on the printed circuit board; (b)
flux application and placement; (c) reflow soldering; (d) encapsulation.

Circuit Board Structures and Features
Figure 28.29 Printed circuit board structures and design features.

Ch28 microelectronic devices Erdi Karaçal Mechanical Engineer University of Gaziantep

More Related Content

What's hot (20)

Similar to Ch28 microelectronic devices Erdi Karaçal Mechanical Engineer University of Gaziantep (20)

More from Erdi Karaçal (6)

Recently uploaded (20)

Ch28 microelectronic devices Erdi Karaçal Mechanical Engineer University of Gaziantep