The document summarizes a student's final project to design and construct a low pressure capacitively coupled plasma etcher. Key points:
- The objective was to design a plasma etch source that can hold a vacuum and create a stable plasma for etching.
- The initial design was simplified using aluminum and graphite electrodes. The final design maintained the materials due to cost but added insulation on the electrodes.
- Construction involved machining parts and assembling the chamber, which was then tested and optimized by addressing leaks and plasma instability issues.
- Diagnostics using optical emission spectroscopy were planned to analyze the plasma properties and etch species.
- Future work proposed improving the design and experimenting with