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Advanced Matching for CDSEM
By LV Tailoring Software
Tool A
Iden
tical
waf
er
Labview
Advanced Matching for CDSEM
By LV Tailoring Software
Scaling Matching procedures.
Qual matching procedures
CLV and CLH patterns – pitch measurement 239.9 nm
Just rough calculation of matching – high dependency of results on the
X-Y placement. Statistically based, pitch measurement (not line or space).
Inter site matching procedure.
Back to back 2 runs of 4-6 different critical layers with 2 to 6 different
measurements per layer. Everything should be matched in 1 nm to 5 nm
(per layer).
PM matching procedures.
Daily monitor/Weekly monitor – impact of charging. See resolution monitor
for results.
Advanced Matching for CDSEM
Line/Space/Pitch dilemma
CDD qual require matching up to 1 nm for most critical layers (95% CI)
How we are measuring ?
Why it is problematic ?
No. Chip No. D No.1 D No.2 D No.3 D No.4 D No.5 D No.6
VSP VL VPTCH HS HL HPTCH
Data P No. Data P No. Data P No. Data P No. Data P No. Data P No.
1 03,04 105.8 1 171.9 2 280.7 3 114.1 4 167.3 5 282.0 6
2 03,05 111.8 1 168.8 2 282.1 3 113.9 4 166.2 5 280.3 6
3 04,04 107.1 1 171.3 2 278.7 3 112.4 4 167.1 5 279.9 6
4 04,05 108.2 1 169.4 2 277.8 3 115.6 4 165.8 5 281.6 6
5 05,04 117.1 1 164.5 2 281.6 3 118.8 4 164.4 5 283.0 6
6 05,05 102.5 1 172.2 2 275.9 3 110.7 4 167.6 5 279.7 6
7
8
9
Maximum 117.1 172.2 282.1 118.8 167.6 283.0
Minimum 102.5 164.5 275.9 110.7 164.4 279.7
Mean 108.7 169.7 279.5 114.3 166.4 281.1
Max-Min 14.7 7.7 6.2 8.1 3.2 3.4
3 Sigma 15.3 8.6 7.3 8.3 3.6 4.0
Advanced Matching for CDSEM
Line/Space/Pitch dilemma – Normalization issue as result of 2
measurement gates application for pitch measurement
On the specimen
Line Space
Pitch
SE intensity profile
0
50
100
150
200
250
1
Pixel
Brightness
Line
Threshold
60%
SE intensity profile
0
50
100
150
200
250
1
Pixel
Brightness
Space
Threshold
60%
SE intensity profile
0
50
100
150
200
250
1
Pixel
Brightness
Pitch
Threshold
60%
Advanced Matching for CDSEM
Placement dilemma – Are we measuring on the same place?
Line/Space/Pitch dilemma – Why Line + Space≠ Pitch ?
How we could proceed in order to reduce impact of placement shift
and normalization error
Advanced Matching for CDSEM
Placement and Line/Space/Pitch dilemma – Solution by SW
Compare just correlated parts of the images taken for matching.
Correlated picture
Shifted picture
Shifted picture
Advanced Matching for CDSEM
Impact of Placement dilemma – testing results
Verticalsize1
0.992
0.993
0.994
0.995
0.996
0.997
0.998
0.999
1
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.994599
0.994521
0.994358
0.995913
Mean
0.001199
0.000896
0.002050
0.002302
Std Dev
0.00054
0.00040
0.00092
0.00115
Std Err Mean
0.99311
0.99341
0.99181
0.99225
Low er 95%
0.99609
0.99563
0.99690
0.99958
Upper 95%
Means and Std Deviations
Oneway Analysis of Vertical size 1 By ID
Horizontalsize1
0.9875
0.99
0.9925
0.995
0.9975
1
1.0025
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.995852
0.995347
0.995519
0.994763
Mean
0.002431
0.000126
0.003779
0.000952
Std Dev
0.00109
0.00006
0.00169
0.00048
Std Err Mean
0.99283
0.99519
0.99083
0.99325
Low er 95%
0.9989
0.9955
1.0002
0.9963
Upper 95%
Means and Std Deviations
Oneway Analysis of Horizontal size 1 By ID
Verticalsize2
0.99
0.992
0.994
0.996
0.998
1
1.002
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.994476
0.994563
0.994676
0.996406
Mean
0.001527
0.000808
0.003688
0.003328
Std Dev
0.00068
0.00036
0.00165
0.00166
Std Err Mean
0.99258
0.99356
0.99010
0.99111
Low er 95%
0.9964
0.9956
0.9993
1.0017
Upper 95%
Means and Std Deviations
Oneway Analysis of Vertical size 2 By ID
Horizontalsize2
0.992
0.993
0.994
0.995
0.996
0.997
0.998
0.999
1
1.001
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.996068
0.995563
0.995640
0.994824
Mean
0.001704
0.000530
0.002962
0.000979
Std Dev
0.00076
0.00024
0.00132
0.00049
Std Err Mean
0.99395
0.99490
0.99196
0.99327
Low er 95%
0.99818
0.99622
0.99932
0.99638
Upper 95%
Means and Std Deviations
Oneway Analysis of Horizontal size 2 By ID
Verticalsize3
0.99
0.9925
0.995
0.9975
1
1.0025
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.999648
0.994572
0.995677
0.993940
Mean
0.000996
0.001492
0.003655
0.003117
Std Dev
0.00045
0.00067
0.00163
0.00156
Std Err Mean
0.99841
0.99272
0.99114
0.98898
Low er 95%
1.0009
0.9964
1.0002
0.9989
Upper 95%
Means and Std Deviations
Oneway Analysis of Vertical size 3 By ID
Horizontalsize3
0.99
0.9925
0.995
0.9975
1
1.0025
After 1 After 2 Before 1 Before 2
ID
Excluded Row s 1
After 1
After 2
Before 1
Before 2
Level
5
5
5
4
Number
0.995766
0.995904
0.995919
0.996379
Mean
0.001444
0.001715
0.002354
0.004105
Std Dev
0.00065
0.00077
0.00105
0.00205
Std Err Mean
0.99397
0.99378
0.99300
0.98985
Low er 95%
0.9976
0.9980
0.9988
1.0029
Upper 95%
Means and Std Deviations
Oneway Analysis of Horizontal size 3 By ID
Advanced Matching for CDSEM
Gain in implemented.
1. Qual speed up.
2. Reliable “of the fly” measure of matching.
3. As vendor application for tool calibration (image shift
parameter).
4. In connection with resolution monitor powerful application for
tool stability tracing.
5. PM elimination (from time based activity to performance based).
Advanced Matching for CDSEM

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LVTS Advanced matching matching concept for CDSEM

  • 1. Advanced Matching for CDSEM By LV Tailoring Software
  • 2. Tool A Iden tical waf er Labview Advanced Matching for CDSEM By LV Tailoring Software
  • 3. Scaling Matching procedures. Qual matching procedures CLV and CLH patterns – pitch measurement 239.9 nm Just rough calculation of matching – high dependency of results on the X-Y placement. Statistically based, pitch measurement (not line or space). Inter site matching procedure. Back to back 2 runs of 4-6 different critical layers with 2 to 6 different measurements per layer. Everything should be matched in 1 nm to 5 nm (per layer). PM matching procedures. Daily monitor/Weekly monitor – impact of charging. See resolution monitor for results. Advanced Matching for CDSEM
  • 4. Line/Space/Pitch dilemma CDD qual require matching up to 1 nm for most critical layers (95% CI) How we are measuring ? Why it is problematic ? No. Chip No. D No.1 D No.2 D No.3 D No.4 D No.5 D No.6 VSP VL VPTCH HS HL HPTCH Data P No. Data P No. Data P No. Data P No. Data P No. Data P No. 1 03,04 105.8 1 171.9 2 280.7 3 114.1 4 167.3 5 282.0 6 2 03,05 111.8 1 168.8 2 282.1 3 113.9 4 166.2 5 280.3 6 3 04,04 107.1 1 171.3 2 278.7 3 112.4 4 167.1 5 279.9 6 4 04,05 108.2 1 169.4 2 277.8 3 115.6 4 165.8 5 281.6 6 5 05,04 117.1 1 164.5 2 281.6 3 118.8 4 164.4 5 283.0 6 6 05,05 102.5 1 172.2 2 275.9 3 110.7 4 167.6 5 279.7 6 7 8 9 Maximum 117.1 172.2 282.1 118.8 167.6 283.0 Minimum 102.5 164.5 275.9 110.7 164.4 279.7 Mean 108.7 169.7 279.5 114.3 166.4 281.1 Max-Min 14.7 7.7 6.2 8.1 3.2 3.4 3 Sigma 15.3 8.6 7.3 8.3 3.6 4.0 Advanced Matching for CDSEM
  • 5. Line/Space/Pitch dilemma – Normalization issue as result of 2 measurement gates application for pitch measurement On the specimen Line Space Pitch SE intensity profile 0 50 100 150 200 250 1 Pixel Brightness Line Threshold 60% SE intensity profile 0 50 100 150 200 250 1 Pixel Brightness Space Threshold 60% SE intensity profile 0 50 100 150 200 250 1 Pixel Brightness Pitch Threshold 60% Advanced Matching for CDSEM
  • 6. Placement dilemma – Are we measuring on the same place? Line/Space/Pitch dilemma – Why Line + Space≠ Pitch ? How we could proceed in order to reduce impact of placement shift and normalization error Advanced Matching for CDSEM
  • 7. Placement and Line/Space/Pitch dilemma – Solution by SW Compare just correlated parts of the images taken for matching. Correlated picture Shifted picture Shifted picture Advanced Matching for CDSEM
  • 8. Impact of Placement dilemma – testing results Verticalsize1 0.992 0.993 0.994 0.995 0.996 0.997 0.998 0.999 1 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.994599 0.994521 0.994358 0.995913 Mean 0.001199 0.000896 0.002050 0.002302 Std Dev 0.00054 0.00040 0.00092 0.00115 Std Err Mean 0.99311 0.99341 0.99181 0.99225 Low er 95% 0.99609 0.99563 0.99690 0.99958 Upper 95% Means and Std Deviations Oneway Analysis of Vertical size 1 By ID Horizontalsize1 0.9875 0.99 0.9925 0.995 0.9975 1 1.0025 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.995852 0.995347 0.995519 0.994763 Mean 0.002431 0.000126 0.003779 0.000952 Std Dev 0.00109 0.00006 0.00169 0.00048 Std Err Mean 0.99283 0.99519 0.99083 0.99325 Low er 95% 0.9989 0.9955 1.0002 0.9963 Upper 95% Means and Std Deviations Oneway Analysis of Horizontal size 1 By ID Verticalsize2 0.99 0.992 0.994 0.996 0.998 1 1.002 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.994476 0.994563 0.994676 0.996406 Mean 0.001527 0.000808 0.003688 0.003328 Std Dev 0.00068 0.00036 0.00165 0.00166 Std Err Mean 0.99258 0.99356 0.99010 0.99111 Low er 95% 0.9964 0.9956 0.9993 1.0017 Upper 95% Means and Std Deviations Oneway Analysis of Vertical size 2 By ID Horizontalsize2 0.992 0.993 0.994 0.995 0.996 0.997 0.998 0.999 1 1.001 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.996068 0.995563 0.995640 0.994824 Mean 0.001704 0.000530 0.002962 0.000979 Std Dev 0.00076 0.00024 0.00132 0.00049 Std Err Mean 0.99395 0.99490 0.99196 0.99327 Low er 95% 0.99818 0.99622 0.99932 0.99638 Upper 95% Means and Std Deviations Oneway Analysis of Horizontal size 2 By ID Verticalsize3 0.99 0.9925 0.995 0.9975 1 1.0025 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.999648 0.994572 0.995677 0.993940 Mean 0.000996 0.001492 0.003655 0.003117 Std Dev 0.00045 0.00067 0.00163 0.00156 Std Err Mean 0.99841 0.99272 0.99114 0.98898 Low er 95% 1.0009 0.9964 1.0002 0.9989 Upper 95% Means and Std Deviations Oneway Analysis of Vertical size 3 By ID Horizontalsize3 0.99 0.9925 0.995 0.9975 1 1.0025 After 1 After 2 Before 1 Before 2 ID Excluded Row s 1 After 1 After 2 Before 1 Before 2 Level 5 5 5 4 Number 0.995766 0.995904 0.995919 0.996379 Mean 0.001444 0.001715 0.002354 0.004105 Std Dev 0.00065 0.00077 0.00105 0.00205 Std Err Mean 0.99397 0.99378 0.99300 0.98985 Low er 95% 0.9976 0.9980 0.9988 1.0029 Upper 95% Means and Std Deviations Oneway Analysis of Horizontal size 3 By ID Advanced Matching for CDSEM
  • 9. Gain in implemented. 1. Qual speed up. 2. Reliable “of the fly” measure of matching. 3. As vendor application for tool calibration (image shift parameter). 4. In connection with resolution monitor powerful application for tool stability tracing. 5. PM elimination (from time based activity to performance based). Advanced Matching for CDSEM