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Micro Electro Mechanical
Systems (MEMS)
Dr.K.GOMATHI
Department of Mechatronics Engineering
Kongu Engineering College, Perundurai
CONTENTS
What is MEMS?
Miniaturization
Components of MEMS
Applications
Fabrication Process
Micro Machining Process
CAD tools
MEMS
MEMS = Micro Electro Mechanical System
Any engineering system that performs electrical and
mechanical functions with components in micrometers is a
MEMS.
Miniaturization
Miniaturization
(Courtesy of Denso Research Laboratories, Denso Corporation, Aichi, Japan)
Timeline of MEMS
• 1959 - “There’s Plenty of Room at the Bottom”
–Richard Feynman gives a milestone
presentation at California Institute of
Technology. He issues a public challenge by
offering $1000 to the first person to create an
electrical motor smaller than 1/64th of an
inch.
Components of MEMS
What do MEMS Do?
Airbag ADXL (Analog
Devices 2000)
Microsystem
The sense Sensors
Signal Treatment
The Brain
Actuators
The muscle
US name : MEMS
European name : Microsystems Technology
Japanese name : Micromachines or Micromechatronics
APPLICATIONS
Automotive Industry Health care Aerospace Industry
Industrial Products Consumer
Products
Telecommunication
MEMS Fabrication Process
Photolithography
 Ion implantation
 Diffusion
Oxidation
Chemical vapour deposition
 Physical vapour deposition
(Sputtering)
Deposition by expitaxy
Etching
Photolithography
Two Kind of Photo resists
Positive resists Negative resists
(1)PMMA (Polymethymethacrylate)
resists,
(2)two-component DQN resist
involving diazoquinone ester (DQ)
and phenolic novolak resin (N).
(1) Two-component bis (aryl) azide
rubber resists, and
(2) Kodak KTFR (azide-sensitized
polyisotroprene rubber).
Positive resists are sensitive to UV
lights with the maximum sensitivity at
a wavelength of 220 nm.
Negative resists are less sensitive to
optical and x-ray exposures but more
sensitive to electron beams
Solvents
KOH (potassium peroxide),
TMAH (tetramethylammonium
hydroxide),
ketones or acetates.
Xylene is the most commonly used
solvent
Application of photoresists
Fabrication Process -Contd
• Ion Implantation
It is physical process used to dope silicon substrates.
• Diffusion
Diffusion is another common technique for doping silicon
substrates.
Unlike ion implantation, diffusion takes place at high
temperature.
Oxidation
Chemical Vapour Deposition (CVD)
Chemical Vapour Deposition (CVD)
• Physical Vapor Deposition- Sputtering
It is used to deposit thin metal films
• Deposition by Epitaxy
Similar Material
• Etching
 Wet etching or chemical Etching
 Dry etching or Plasma Etching
Fabrication Process -Contd
Microsystems Fabrication Processes
• Bulk Micromachining
- removing materials from thick substrates
• Surface Micromachining
- adding material to the substrate.
• LIGA
-“Lithography (Lithographie),electroforming
(Galvanoformung), and molding (Abformung)”.
• SLIGA
Micromachining Process
Simulation software package’s
• Coventorware
• Intellisuite
• Comsol Multiphysics
• Ansys
• TCAD
• SUGAR
Cantilever Beam
THANK YOU

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Mems Introduction

  • 1. Micro Electro Mechanical Systems (MEMS) Dr.K.GOMATHI Department of Mechatronics Engineering Kongu Engineering College, Perundurai
  • 2. CONTENTS What is MEMS? Miniaturization Components of MEMS Applications Fabrication Process Micro Machining Process CAD tools
  • 3. MEMS MEMS = Micro Electro Mechanical System Any engineering system that performs electrical and mechanical functions with components in micrometers is a MEMS.
  • 5. Miniaturization (Courtesy of Denso Research Laboratories, Denso Corporation, Aichi, Japan)
  • 6. Timeline of MEMS • 1959 - “There’s Plenty of Room at the Bottom” –Richard Feynman gives a milestone presentation at California Institute of Technology. He issues a public challenge by offering $1000 to the first person to create an electrical motor smaller than 1/64th of an inch.
  • 8. What do MEMS Do? Airbag ADXL (Analog Devices 2000) Microsystem The sense Sensors Signal Treatment The Brain Actuators The muscle US name : MEMS European name : Microsystems Technology Japanese name : Micromachines or Micromechatronics
  • 9. APPLICATIONS Automotive Industry Health care Aerospace Industry Industrial Products Consumer Products Telecommunication
  • 10. MEMS Fabrication Process Photolithography  Ion implantation  Diffusion Oxidation Chemical vapour deposition  Physical vapour deposition (Sputtering) Deposition by expitaxy Etching
  • 12. Two Kind of Photo resists Positive resists Negative resists (1)PMMA (Polymethymethacrylate) resists, (2)two-component DQN resist involving diazoquinone ester (DQ) and phenolic novolak resin (N). (1) Two-component bis (aryl) azide rubber resists, and (2) Kodak KTFR (azide-sensitized polyisotroprene rubber). Positive resists are sensitive to UV lights with the maximum sensitivity at a wavelength of 220 nm. Negative resists are less sensitive to optical and x-ray exposures but more sensitive to electron beams Solvents KOH (potassium peroxide), TMAH (tetramethylammonium hydroxide), ketones or acetates. Xylene is the most commonly used solvent
  • 14. Fabrication Process -Contd • Ion Implantation It is physical process used to dope silicon substrates. • Diffusion Diffusion is another common technique for doping silicon substrates. Unlike ion implantation, diffusion takes place at high temperature.
  • 18. • Physical Vapor Deposition- Sputtering It is used to deposit thin metal films • Deposition by Epitaxy Similar Material • Etching  Wet etching or chemical Etching  Dry etching or Plasma Etching Fabrication Process -Contd
  • 20. • Bulk Micromachining - removing materials from thick substrates • Surface Micromachining - adding material to the substrate. • LIGA -“Lithography (Lithographie),electroforming (Galvanoformung), and molding (Abformung)”. • SLIGA Micromachining Process
  • 21. Simulation software package’s • Coventorware • Intellisuite • Comsol Multiphysics • Ansys • TCAD • SUGAR