This document summarizes key techniques for fabricating semiconductor nanostructures including quantum wells, wires, and dots. Epitaxial growth techniques like molecular beam epitaxy and metal organic vapor phase epitaxy are used to produce high quality quantum wells with very thin and abrupt layers. Lithography and etching can be used to define wires or dots on a surface which are then etched to produce free-standing nanostructures, though the etching damages the surface. Cleaved edge overgrowth involves cleaving a substrate with quantum wells at an angle and regrowing layers to produce T-shaped quantum wires. Growth on vicinal or patterned substrates can be used to direct growth in grooves or pits to form wires or dots with better quality than lithography