Submitted By,
Md.Mizanur Rahman
ID.183001016
Department of EEE
Green University of Bangladesh
Submitted To,
DR. A. A. MOHAMMAD
MONZUR-UL-AKHIR
Assistant Professor
Department of EEE
Green University of
Bangladesh
wet etching
wet etching
OUTLINE:
What is Etching ?
Types of Etching
What is Wet Etching ?
What is Wet etching process?
Advantages of Wet Etching
Disadvantages of Wet Etching
What is Etching ?
 Simply removing unwanted
materials from the surface to form
a required pattern.
Types of Etching
 Wet Etching:
 Dry Etching(plasma
Etching):
What is Wet Etching ?
 Wet etching is a material removal process that
uses liquid chemicals or etchants to remove
materials from a wafer.
1.Wet etching is a material removal
process that uses liquid chemicals
or etchants to remove materials
from a wafer.
2.This reaction entails the oxidation
of the material then dissolving the
oxidized material.
3.Diffusion of the byproducts in the
reaction from the reacted surface.
 What is wet etching
process?
 Advantages of Wet Etching
 Damage-free finish to wafer surface.
 Simple and direct etching process.
 Occur at atomaspheric environment.
 Cheaper cost.
 High etch selective.
 Good etch uniformity.
 Disadvantages of Wet Etching
 Isotropic etching.
 No control for precision etching.
 The resist cumming when the resist is
incompletely expoxd or insufficiently developed
and this residual resist act as etching mask .
wet etching

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wet etching

  • 1. Submitted By, Md.Mizanur Rahman ID.183001016 Department of EEE Green University of Bangladesh Submitted To, DR. A. A. MOHAMMAD MONZUR-UL-AKHIR Assistant Professor Department of EEE Green University of Bangladesh
  • 4. OUTLINE: What is Etching ? Types of Etching What is Wet Etching ? What is Wet etching process? Advantages of Wet Etching Disadvantages of Wet Etching
  • 5. What is Etching ?  Simply removing unwanted materials from the surface to form a required pattern.
  • 6. Types of Etching  Wet Etching:  Dry Etching(plasma Etching):
  • 7. What is Wet Etching ?  Wet etching is a material removal process that uses liquid chemicals or etchants to remove materials from a wafer.
  • 8. 1.Wet etching is a material removal process that uses liquid chemicals or etchants to remove materials from a wafer. 2.This reaction entails the oxidation of the material then dissolving the oxidized material. 3.Diffusion of the byproducts in the reaction from the reacted surface.  What is wet etching process?
  • 9.  Advantages of Wet Etching  Damage-free finish to wafer surface.  Simple and direct etching process.  Occur at atomaspheric environment.  Cheaper cost.  High etch selective.  Good etch uniformity.
  • 10.  Disadvantages of Wet Etching  Isotropic etching.  No control for precision etching.  The resist cumming when the resist is incompletely expoxd or insufficiently developed and this residual resist act as etching mask .