The paper investigates the influence of overgrowth on the properties of p-n junctions in heterostructures, focusing on the distribution of dopants and methods to enhance junction sharpness. Various techniques like diffusion, ion implantation, and annealing are analyzed to improve dopant distribution and reduce thermal issues in p-n junctions. The findings demonstrate that integrating different doping approaches can optimize both sharpness and uniformity of dopant distribution in semiconductor devices.