The paper presents a nonlinear model for optimizing the manufacturing process of complementary horizontal field-effect heterotransistors, particularly focusing on the dynamics of dopant and radiation defect distributions. It formulates recommendations for the annealing processes of dopants during the production of P-N junctions to enable the creation of thinner transistors with reduced dimensions. Analytical solutions are derived through the application of Fick's laws to model the spatio-temporal distribution of dopants and radiation-induced defects.