vlsi Lecture05
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The document discusses terminology and design rules for VLSI systems. It defines common components of transistors like the body, diffusion, source, and drain. It also discusses design rules that must be followed like feature size, lambda rules that govern minimum distances, and how rules change between fabrication facilities and process technologies. Pitch of routing tracks and methods for estimating gate areas are also covered at a high level.
vlsi Lecture05
- 1. Design and Implementation of VLSI Systems (EN1600) lecture05
- 2. Summary of Terminology • body • diffusion (n/p) • source • drain • well • tap • contact • metal track • via • polysilicon gate length/width • gate oxide • channel All these structures must obey the dimensions and separation rules dictated by the process fabrication facility
- 3. Process design rules • Design rules change from fab to fab • Fab examples: IBM, Intel, TI, TSMC, UMC, MOSIS • Design rules change according to the process technology
- 4. Lambda rules • Feature Size: minimum distance between source and drain of transistor • Feature size = 2λ (@ 90nm feature size λ=45) • According to Moore’s Law, how much does the feature size scale by every ~2 years?
- 5. Design rules and gate layout • Lambda rules are conservative
- 7. More and more design rules
- 9. Layout of a 3-input NAND gate
- 10. Stick diagrams • No need to be drawn to scale
- 11. Pitch of routing tracks